Chemical filter system "Risoguard 12"
Chemical filter system for high-end semiconductor exposure equipment, such as ArF liquid immersion lithography.
"RisoGuard 12" is a high-efficiency chemical filter system with a HEPA filter developed for high-end semiconductor exposure equipment, including ArF immersion lithography, designed for the removal of acidic, basic, and condensable organic gases. It is equipped with 12 LPS filters or BSMmax filters and 6 HEPA filters within the cabinet. It demonstrates high contaminant removal performance even in low-concentration environments, making it ideal for processes that require a clean environment and for preventing performance degradation due to contamination of optical components. 【Features】 - Long lifespan (equipped with LPS or BSMmax filters) - Space-saving - Low cost (filter recycling through the Refill program) For more details, please download the catalog or contact us.
basic information
【Specifications】 ○ System part number: KAX007890 ○ Chemical filter part number: P512612 ○ Set airflow: 2,600m3/hr ○ Dimensions: Width 850mm × Height 1,850mm × Depth 1,200mm ○ Approximate weight (including filter): 600kg ○ Operating power supply: Not required ○ Compressed air for airtightness: Not required For more details, please download the catalog or contact us.
Price range
Delivery Time
Model number/Brand name
LITHOGUARD-12
Applications/Examples of results
【Usage】 ○ It can be installed in air supply lines for semiconductor exposure devices and manufacturing or experimental equipment that require ultra-clean environments. For more details, please download the catalog or contact us.
