All products and services
1～9 item / All 9 items
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Vacuum film formation device (sputtering device, deposition device)
Large area sputtering is possible! Film deposition can be achieved even without cooling.
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Opposing target sputtering device
No damage to the substrate! A vacuum deposition device capable of ultra-low temperature sputtering.
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Research and development equipment / ultra-high vacuum equipment
Build a reliable system! Leave maintenance and modifications to us.
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Electron beam evaporation device
Yashima's electron beam deposition equipment is all custom-ordered. It is efficient, highly expandable for the future, and simple. Therefore, the price is also reasonable.
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Experimental small vacuum deposition device
Equipped with MAX10V-150A power and a large-capacity LN2 trap, it enables rapid sample preparation. Its compact size makes it space-saving and reasonably priced.
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Experimental sputtering device
Equipped with a simple yet φ3-inch target magnetron cathode and a wide-range turbo molecular pump with a capacity of 200 L/s.
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Current input terminal
We provide vacuum feedthrough current terminals from thermocouples to high voltage and high current terminals at a low cost.
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Uniform Plasma Sputtering Device
High-quality sputtering through uniform plasma confinement
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Vacuum viewport (glass window)
Vacuum viewport (glass window)
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