Development of 'Al Damage-Free Insulating Film Etching Solution'
林純薬工業 電子材料部
Lin Jun Pharmaceutical Industry Co., Ltd. has recently developed a damage-free aluminum (Al) etching solution for silicon oxide and silicon nitride (insulation film) etching. By using this etching solution, it becomes possible to etch insulation films without corroding Al or Al alloys, eliminating the need for processes to protect Al or Al alloys, which can improve the overall throughput of the manufacturing process. Our company will continue to propose functional chemical solutions that emphasize energy savings and cost reduction through process shortening to many companies.
