Hayashi Pure Chemical Ind., Ltd. Electronic Materials Official site

GaP roughening etching solution

The surface of the GaP film and the surfaces, slopes, and sides of the GaP substrate can be effectively roughened through etching, improving the light extraction efficiency.

The features of this product are as follows: - It is possible to form desired unevenness and improve light extraction efficiency. - Processing can be done at low temperatures and in a short time. - The in-plane uniformity of the uneven surface shape is good. Keywords: frost treatment, unevenness, LED, light-emitting diode, gallium phosphide, gallium nitride.

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GaP rough surface etching solution "Pure Etch F200 series"

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We offer a wide range of standard samples, including pesticide standard samples and environmental hormone-related substance standard samples, totaling around three thousand types, to various research institutes and survey organizations nationwide. In addition to reagents, we are also engaged in research and development of chemicals for the electronics industry, and in recent years, we have established a collaborative development system with users to propose new functions and conduct performance evaluations, supporting the development of the electronics industry.