各金属膜エッチング液
各金属膜エッチング液
各金属膜エッチング液の製品のご紹介です。
1~13 件を表示 / 全 13 件
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Al taper control etching solution
Etch the Al or Al alloy film at the desired taper angle.
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Ag・Ag alloy・Ag-based laminated film etching solution
This etching solution is ideal for etching single-layer films of silver alloys such as Ag single films, APC (Ag-Pd-Cu alloy) films, or laminated films of Ag/transparent conductive films.
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Cu etching solution "Pure Etch C series"
We etch Cu and Cu alloy films effectively. We offer solutions for standard thin film etching and bulk etching of Cu/Ti stacked films.
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Ti etching solution standard, Ti seed layer etching solution
We will etch the Ti film effectively. We have options for standard thin film etching and Ti seed layer etching.
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W Etching Solution 'Pure Etch W Series'
We will etch the W film well.
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Cr Etching Solution "Pure Etch CR series"
We will etch the Cr film well. If you are considering the formation of fine patterns, we also offer suggestions for pretreatment solutions to improve wettability.
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ITO etching solution "Clean Etch ITO series"
We provide excellent etching for ITO films, with options available for both a-ITO etching and p-ITO etching.
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Au Etching Solution "Pure Etch AU series"
We will etch the Au film well. There are also etching solutions for seed layers that cause little damage to the Au plating and allow for etching of the Au seed layer.
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Standard sample for Al・Mo・Mo/Al/Mo multilayer film
It etches single films of Al, Al alloys, or Mo, Mo alloys, as well as layered films such as Mo/Al/Mo and Mo alloy/Al alloy/Mo alloy effectively.
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Ag nanowire etching solution
We provide excellent etching of Ag nanowire films, available for both full etching and partial etching.
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Crystal etching liquid "Pure Etch ZE series"
We etch the quartz with a flatter bottom shape than conventional products without corroding the mask made of resist or metal films (such as Au and Cr).
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Al Damage-Free Si Etching Solution (Anisotropic)
Al and Al alloy films are anisotropically etched well without corrosion.
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Si etching solution (isotropic)
We perform good isotropic etching of the Si film. In addition to standard isotropic etching solutions, we also have thinning etching solutions that are optimal for thinning Si substrates.
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