Atmospheric pressure argon plasma device
Direct plasma method using argon gas
This is a direct plasma device that uses inert argon as the carrier gas. By directly irradiating the plasma onto the substrate with stable glow discharge, powerful modification can be achieved. It excels in cost performance due to low power consumption and low gas usage. Since the generation of ozone and nitrogen oxides is extremely low, exhaust equipment is not required.
basic information
Corresponding plasma width: Possible from 60mm to 2500mm Standard consumption (per 100mm head length) Carrier gas: Argon 3L/min Reaction gas: Oxygen 15mL/min Power consumption: 90w
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Model number/Brand name
ARP Series
Applications/Examples of results
○ ACF crimping pre-process ○ Treatment before optical bonding ○ Surface modification for materials with poor wettability ○ Removal of photoresist residues from glass, wafers, etc.
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