Realizing Precision Control in Energy Innovation Hydrogen, fuel cells, CCUS, biofuels, CNT manufacturing. There are technologies on-site that monitor precise flows to support the energy of the future. Brooks Instrument's flow meters support the energy transition.

Low-emissivity (Low-E) coated architectural glass has become one of the most popular functional building materials. It plays a crucial role in improving the energy efficiency and energy-saving properties of buildings by minimizing heat loss and internal condensation. The coating (thin film) applied to the glass controls the flow of visible light energy passing through the glass. This coating alters the characteristics of light transmission, reflection, and absorption in different parts of the electromagnetic spectrum, such as infrared, visible light, and ultraviolet. When viewed from inside the building, Low-E glass reflects energy back into the building, achieving significantly lower heat loss compared to regular glass. When viewed from outside the building, Low-E glass allows the visible portion of solar energy to pass through while minimizing the infrared portion, thereby reducing heat loss from the building.

Model SLA5850/SLA5851/SLA5853/SLA5860/SLA5861/SLA5863 "With just one unit, you can use 14 types of pressure and flow rates in a single process." Imagine such a mass flow controller platform. Moreover, it features excellent reproducibility, precision, and repeatability. This is the evolved simple performance of the SLA5800 series mass flow controllers/meters. The SLA5800 series boasts high accuracy, zero point stability, and repeatability that are characteristic of Brooks Instrument, a leader in mass flow measurement and control technology. Equipped with configurable advanced multi-gas/multi-range capabilities, it offers superior zero drift specifications compared to competing products while demonstrating long-term maintenance of factory calibration and accuracy.

Many people may have questions like, "What can be done with IoT?" and "What is needed?" upon hearing the term IoT. Through digital communication, it is possible to obtain various information such as flow sensors, valves, circuit boards, and abnormal monitoring that were not accessible with traditional analog control. For example, by monitoring the valve opening, one can detect blockages in the equipment and identify leaks from cumulative flow. This information directly contributes to reducing downtime and improving quality through continuous long-term monitoring and knowledge-based management. Compatible models include those with digital communication via RS485, in addition to traditional analog controls like 0-5VDC and 4-20mA. (Older models such as the 58xxS, MfxxS series, SLA58xxS, and SLAMfxxS series). Even older models that do not support digital communication can be upgraded to the latest mass flow models, enabling digital communication. The dimensions between new and old models are the same, and no wiring changes are necessary. Additionally, we can provide control boxes for data collection from mass flow. This enables a "visualization" of small IoT without making large changes to the equipment.

"Maximizing the Best Performance" This is the industry's first fully pressure-insensitive type of pressure-based mass flow controller (P-MFC) specifically designed for advanced etching and deposition processes in semiconductor manufacturing. The GP200 series P-MFC adopts a patented architecture that overcomes the limitations of conventional P-MFCs, enabling high-precision process gas supply even with low vapor pressure process gases. It also features a built-in differential pressure sensor and a unique design that places the valve downstream, allowing for high-precision process gas supply across the widest range of operating conditions in the industry. Due to its compatibility with a wide range of process conditions, it can be used as a replacement or upgrade for conventional P-MFCs and thermal MFCs. Additionally, by eliminating the need for components such as pressure regulators and converters, it simplifies the gas supply system and reduces costs. [Main Applications] ■ Semiconductor Manufacturing ■ Etching ■ CVD ■ Gas flow control applications requiring high-purity all-metal flow paths