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GT1000, GT1300, and Full-View(R) model successors "A simple yet robust design created to meet accuracy requirements" This is a robust glass tube area flow meter suitable for measuring flow rates from low to high, designed to provide long-term stable performance in applications involving gases and liquids where visibility of process fluids is necessary. The accuracy range can be optionally selected from 1% to 10% of full-scale flow. It is ideal for applications such as managing purge flow, seal oil units, bearing lubricants, and cooling water management. Additionally, when updating our GT1000, GT1300, and Full-View(R) 1100 series (models 1110, 1114, 1140, 1144), you can choose from model codes as compatible successors. Applications: ■ Industrial processes ■ Pharmaceutical manufacturing ■ Oil and gas pumping and refining processes ■ Chemical manufacturing ■ Burner control ■ Water treatment and supply systems

This is a glass tube area flow meter suitable for measuring flow rates from low to high, designed with a robust structure that ensures long-term stable performance for applications involving gases and liquids where visibility of the process fluid is necessary. We will explain this in a 1 minute and 31 seconds video. https://www.youtube.com/watch?v=BgZMdBY4kLM Contents of the recording: ■ Basic mechanism and applications ■ Features ■ Monitoring important flow conditions ■ Scale design (The easy-to-read scale design allows for accurate flow monitoring. It can be operated intuitively, requiring no training for use.)

We explain the operating principle of the GP200 series metal seal type pressure-based mass flow meter (P-MFC) in a video. (English) https://www.youtube.com/watch?v=ZWB03A_9fo8 Video Chapters 00:00 - What is Brooks Instrument? 01:00 - What is a conventional pressure-based MFC? 02:10 - Introduction to the GP200 pressure-based MFC 03:30 - Advantages of the GP200 MFC 03:50 - Pressure measurement method of the GP200 MFC 04:45 - Superiority of the GP200 This pressure-based mass flow meter adopts a unique design that overcomes the limitations of conventional pressure-based MFCs and significantly improves process performance.

"Maximizing the Best Performance" This is the industry's first fully pressure-insensitive type of pressure-based mass flow controller (P-MFC) specifically designed for advanced etching and deposition processes in semiconductor manufacturing. The GP200 series P-MFC adopts a patented architecture that overcomes the limitations of conventional P-MFCs, enabling high-precision process gas supply even with low vapor pressure process gases. It also features a built-in differential pressure sensor and a unique design that places the valve downstream, allowing for high-precision process gas supply across the widest range of operating conditions in the industry. Due to its compatibility with a wide range of process conditions, it can be used as a replacement or upgrade for conventional P-MFCs and thermal MFCs. Additionally, by eliminating the need for components such as pressure regulators and converters, it simplifies the gas supply system and reduces costs. [Main Applications] ■ Semiconductor Manufacturing ■ Etching ■ CVD ■ Gas flow control applications requiring high-purity all-metal flow paths

The operating principles of the SLA series are explained in the video. (English) https://www.youtube.com/watch?v=XKpX3rrt1qc Video Chapters 00:00 What is Brooks Instrument? 00:10 How to connect power to the thermal mass flow meter 00:24 Basic structure of the thermal mass flow meter 00:35 Diverting a portion of the gas flow with a laminar flow element 00:56 Measuring temperature difference with thermal sensors 01:08 Excellent sensor stability 01:37 How to measure process gas flow 02:17 Circuit board of the thermal mass flow meter 02:34 What are advanced alarm and diagnostic functions? <Main advantages of Coriolis flow meters> ■ Long-term stability of the sensor eliminates the need for maintenance or regular recalibration, reducing total ownership costs ■ Brooks Instrument's unique thermal sensor technology improves the S/N ratio and enhances flow accuracy at low set points.