All products and services
31～60 item / All 73 items
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Spin Cleaning Device Automatic Resist Spin Coater Model JASC-200
Target work: Applicable to 2"□ to 5"□ substrates or φ2" to φ5" substrates!
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Spin Cleaning Device High-Performance Vacuum Spin Coater HMSC-300A
Technology has been incorporated to achieve a uniform high-precision coating!
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Spin Cleaning Device Automatic Photoresist Device Model JASC-1200AD
The target work is applicable to a 200mm square substrate or a φ300mm substrate!
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Spin Cleaning Device Spray Development Device SD-8004 Type
Automatic and manual operation will perform developing, rinsing, washing, and spin drying!
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[Demo unit available for loan!] Tabletop spin coater
Space-saving spin coater with integrated exhaust system in this single unit, featuring an inner cup design.
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Single Leaf Spin Spray Cleaning Device SRC-15001
High-pressure pure water is sprayed from a 2-fluid nozzle, followed by finishing cleaning with megasonic!
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Comprehensive Catalog of Processing Equipment "Sheet-Type Wafer Processing Equipment Comprehensive Catalog"
[Free Distribution] Comprehensive Catalog of Automatic Etching Devices and Automatic Development Devices for Circuit Boards
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Single-wafer processing device "Automatic Wafer Cleaning System"
Composed of a combination of a 3-axis multi-joint clean robot and a single-axis robot!
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Single-wafer processing device "Automatic Etching Device"
Install a 3-axis multi-joint clean robot at the center of the device for wafer transport!
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Single-wafer processing device "Automatic substrate developing device"
Install a 3-axis multi-joint clean robot at the center of the device for substrate transport!
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Single Wafer Processing Equipment "Automatic Wafer Resist Coating Device"
Wafer resist coating device that uses high-performance pumps for high-precision coating.
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Single Wafer Processing Equipment "Automatic Resist Coating and Developing System"
Wafer resist coating device that uses high-performance pumps for high-precision coating.
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Single-wafer automatic cleaning device "RCA Wafer Cleaning System"
Customization is OK! We offer quick responses and after-sales support unique to manufacturers.
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Single-wafer automatic cleaning device "RCA Wafer Cleaning System"
Customization is okay! We offer quick responses and after-sales support unique to manufacturers.
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Tabletop Diamond Wire Saw "MH-100"
Perfect for research and development use! Compact and space-saving tabletop diamond wire saw for laboratories.
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MH-500 Automatic Single Diamond Wire Saw
Suitable for cutting brittle materials such as silicon wafers, glass, and quartz using diamond wire for edge trimming.
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MH-1000 Multi-Wire Saw
● Down-cutting method using high-performance electroplated diamond wire ● No slurry required due to fixed abrasives
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CO2 spray cleaning device
The substrate size is up to φ12 inches! Using our unique CO2 rubber jet nozzle.
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Custom-made production achievements: CVD equipment
We have a track record of equipment such as 'plasma CVD systems for metal containers' and 'ICP-type MOCVD systems'!
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DLC coating equipment
Extensive control over membrane properties! You can choose between water-cooled and heated substrate heating sources.
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Plasma CVD device for PET bottles
Coating is possible up to a 3L container! It contributes to reducing logistics costs through lightweight containers.
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RTA device
Supports tray transport! Achieves excellent substrate temperature distribution and gas flow method.
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Carbon nanotube synthesis device
Achieving excellent film thickness distribution and reproducibility! Equipped with a substrate plasma cleaning system.
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Custom Manufacturing Achievements: Sputtering Equipment
We have achievements such as 'sputtering equipment with GB for organic EL' and 'IBS equipment for research and development'!
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Dry etching equipment
Switching between RIE mode and DP mode is possible! Reduction of metal contamination through special surface treatment.
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Custom-made production achievements: Dry etching equipment
We have a track record of devices such as "XeF2 etching equipment" and "batch-type ashing equipment."
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Load lock type EB evaporation deposition device
Reduction of particles through suitable surface treatment! Compatible with high vacuum processes using a load-lock system.
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Load-lock type sputtering device
We can also accommodate combinations of CVD chambers, deposition chambers, plasma cleaning chambers, etc.!
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Custom-made production achievements: Various vacuum devices
Conducting sample processing with a demo unit! We have a track record of "annealing equipment for research and development" and more.
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Oxide/Nitride Plasma CVD Equipment
Controllable extensive membrane properties! Significant particle reduction and improved productivity.
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