Custom-made production achievements: Vapor deposition equipment

We have a track record of devices such as the "two-stage composite Pt deposition system"! Please contact us when you need assistance.

last updated Jul 02, 2025

Vacuum heating drying oven

Vacuum drying of sputter targets, vacuum components, and fixtures can be utilized!

last updated Jul 02, 2025

Multi-target sputtering device

Achieving a substrate temperature of 900℃! Equipped with a 3-axis mechanism on the substrate stage to realize a uniform film thickness distribution.

last updated Jul 02, 2025

Organic EL evaporation device

You can freely choose from the plasma cleaning chamber, organic deposition chamber, electrode deposition chamber, sealing chamber, and more!

last updated Jul 02, 2025

Sputtering device for three-dimensional objects

Achieve high coverage in three-dimensional object film formation! Equipped with up to three sputter cathodes, it enables the layered deposition of metal films, oxide films, and more!

last updated Jul 02, 2025

Plasma CVD device for three-dimensional objects

A simple structure with high versatility! It adopts a unique plasma control method.

last updated Jul 02, 2025

【Thorough Developer Perspective】Custom manufacturing of various devices available.

Consultations are welcome! We handle everything in-house from design to manufacturing and assembly! If you are having trouble with various equipment manufacturing, please feel free to consult with us. *Case study materials are currently available.

last updated Jul 02, 2025

Pressurized RTA device

Maximum substrate heating temperature of 1000℃! Reduces element loss specific to the substrate surface heating process!

last updated Jul 02, 2025

Epitaxial-EB deposition device

A high-temperature process of up to 900°C is possible! This product is suitable for single crystal film formation due to the epitaxial promotion mechanism.

last updated Jul 02, 2025

High-Rate Deposition. Piezoelectric Film Formation Sputtering Device

For semiconductors, MEMS, electronic components, etc.! High-speed and stable continuous film deposition is possible from single crystal epitaxial buffer layers to piezoelectric films!

last updated Jul 02, 2025

High-Rate Depo. Piezoelectric Film Formation Sputtering Device

For semiconductors, MEMS, electronic components, etc.! High-speed and stable continuous film deposition is possible from single crystal epitaxial buffer layers to piezoelectric films!

last updated Jul 02, 2025

Assing device

It is a versatile and compact device that enables etching, ashing, and ion cleaning!

last updated Jul 02, 2025

Screw stirring type powder sputtering device

Space-saving and large capacity! Custom-made options are also available to meet various requests!

last updated Jul 02, 2025