All products and services
1~9 item / All 9 items
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Semiconductor wafer cleaning equipment [Customizable for each item]
Compatible with 2 to 12-inch wafers. Customizable for each item.
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Large substrate (panel level, square substrate) developing equipment
Automatically executes a series of processes from developing to rinsing and spin drying!
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Double-sided scrub cleaning device
Thoroughly cleans the roller brush with a unique shaft-centered water supply system!
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Chemical liquid scrub cleaning device
Introducing a cleaning device that combines disk brush cleaning with chemical cleaning for small-scale production!
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Multi-slot wafer cleaning device
Significantly reduce the usage of pharmaceutical solutions and pure water! Substantially shrink the footprint.
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Single-sheet type resist peeling device
Introducing a system that automatically processes each step from stripping, rinsing, to spin drying!
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Leaf-type spin cleaning device
A sheet multi-spin processor that accommodates complex process needs with multiple chamber configurations!
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Leaf-type spin developing device
Automatic processing of each step from paddle development, spray development, rinsing, to spin drying!
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Resist coater
Mass production support and small batch production support! A system that automatically handles the series of processes for resist coating, baking, and cooling.
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