Semiconductor wafer cleaning equipment [Customizable for each item]

Compatible with 2 to 12-inch wafers. Customizable for each item.

last updated Apr 07, 2026

Large substrate (panel level, square substrate) developing equipment

Automatically executes a series of processes from developing to rinsing and spin drying!

last updated Mar 06, 2026

Double-sided scrub cleaning device

Thoroughly cleans the roller brush with a unique shaft-centered water supply system!

last updated Mar 06, 2026

Chemical liquid scrub cleaning device

Introducing a cleaning device that combines disk brush cleaning with chemical cleaning for small-scale production!

last updated Mar 06, 2026

Multi-slot wafer cleaning device

Significantly reduce the usage of pharmaceutical solutions and pure water! Substantially shrink the footprint.

last updated Mar 06, 2026

Single-sheet type resist peeling device

Introducing a system that automatically processes each step from stripping, rinsing, to spin drying!

last updated Mar 06, 2026

Leaf-type spin cleaning device

A sheet multi-spin processor that accommodates complex process needs with multiple chamber configurations!

last updated Mar 06, 2026

Leaf-type spin developing device

Automatic processing of each step from paddle development, spray development, rinsing, to spin drying!

last updated Mar 05, 2026

Resist coater

Mass production support and small batch production support! A system that automatically handles the series of processes for resist coating, baking, and cooling.

last updated Mar 05, 2026