High-productivity Continuous Atmospheric Pressure CVD (APCVD) System (AMAX1200)
Mass production / NSG(SiO2)/PSG/BPSG deposition High-productivity / Continuous atmospheric pressure CVD (APCVD) system (for 12-inch wafers)
The AMAX series is a continuous atmospheric pressure CVD system (APCVD system) for silicon oxide (SiO2) deposition, such as an interlayer insulator deposition, passivation deposition (protective deposition), and back seal (for epitaxial wafers). 【Features】 ・High productivity of up to 56 wafers/h (wafer size: up to 12 inches) ・No vacuum or plasma is required (thermal CVD) ・SiC trays are used to prevent heavy metal contamination. ・Simple maintenance. ・Low CoO (low running cost) 【Applications】 ・Back seal for epitaxial wafers (NSG) ・Passivation deposition (protective deposition, insulating deposition) (NSG) *For more details, please contact us or download the catalog to view.
basic information
High throughput (high productivity) is achieved by continuously conveying a tray with wafers on it and passing it under the dispersion head (gas nozzle) while heating it from the bottom. The use of SiC for the tray material minimizes heavy metal contamination to ensure stable process performance over the long term.The AMAX1200 is easy to maintain, with an automatic replacement function that facilitates tray replacement. The AMAX1200 can handle wafers up to 12 inches and can deposit up to 56 wafers per hour. ●System size (mm): 2165mm(W) x 4788mm(D) x 2250mm(H) ●Gas type: SiH4/O2 (SiH4/PH3/B2H6/O2/N2) ●Deposition temperature: 350-430 degrees C. *For more details, please contact us or download the catalog to view.
Price range
Delivery Time
Model number/Brand name
AMAX1200
Applications/Examples of results
【Applications】 ・Back seal for epitaxial wafers (NSG) ・Passivation deposition (protective deposition, insulating deposition) (NSG) 【Delivery Record】 ・Domestic and overseas wafer manufacturers ・Semiconductor device manufacturers ・AMAX series total: More than 180 units
