Φ6 Compatible Vacuum/Process Gas High-Speed Annealing Heating System RTP-150
This is an annealing furnace that can be applied to a wide range of applications requiring rapid and uniform heat treatment, including the crystal growth of GaN. Manufactured by Unitemp Japan.
The "RTP-150" is a tabletop vacuum process rapid heating furnace that is suitable for research and development as well as prototype development, classified as one of the smallest in the industry. It supports a maximum temperature of 1000°C and accommodates a variety of gas purge environments. It can be used for various purposes, including crystal growth of new materials such as GaN and SiC, as well as sintering of paste materials. 【Features】 ■ Supports nitrogen gas, oxygen gas, forming gas (hydrogen + nitrogen) purging, as well as high-concentration hydrogen gas purging. ■ Enables precise rapid heating with 24 IR (infrared) heaters on the top and bottom. ■ High-purity quartz chamber. ■ Supports cooling using nitrogen gas purging method. ■ Up to 4 process gas lines (MFC). ■ Achieves vacuum levels of 10^-1 Pa (10^-3 Pa possible with HV model equipped with TMP). ■ Standard touch panel monitor for easy operation. *For more details, please refer to the PDF document or feel free to contact us.
basic information
【Specifications】 ■Device Size (WxDxH): 504 x 504 x 570mm ■Device Weight: Approximately 80kg ■Effective Object Size (WxD): 156 x 156mm ■Heating Method: Cross-arranged IR Heater ■Maximum Reachable Temperature: 1000℃ ■Maximum Heating Rate (depending on the thermal capacity of the object): 75K/sec. *EP model is 150K/sec. ■Maximum Cooling Rate (depending on the thermal capacity of the object): 190K/min. (T=1200℃>400℃) ■Cooling Method: Nitrogen Gas Purge Method ■Vacuum Reach: 10-1Pa *HV model is 10-3Pa ■Controller: 7-inch Touch Panel Controller (SIMATIC TP-700) ■Number of Profile Program Registrations: Up to 50 programs ■Number of Program Steps: Up to 50 steps ■Process Data Storage Location: USB Memory/Ethernet ■Power Supply Specifications: 2x Three-phase 200V 50/60Hz Maximum 40A (Total 80A) *For more details, please refer to the PDF document or feel free to contact us.
Price information
10 million to 15 million yen (depending on the model and options)
Price range
P7
Delivery Time
OTHER
The delivery time is approximately 3 to 4 months from the confirmation of your order (please contact us for more details, as delivery times may vary depending on the situation).
Model number/Brand name
RTP-150/RTP-150-HV/RTP-150-EP
Applications/Examples of results
【Applications】 ■Various high-temperature heat treatments from Si to SiC, GaN, Ga2O3 materials ■Nitride and oxide film formation ■Crystal activation after ion implantation ■Ohmic contact formation ■Heat treatment of low-k materials ■Reduction of Si roughness through hydrogen annealing *For more details, please refer to the PDF document or feel free to contact us.
Line up（6）
| Model number | overview |
|---|---|
| RTP-100 | |
| RTP-100-HV | |
| RTP-150 | |
| RTP-150-HV | |
| RTP-150-EP | |
| VPO-1000-300 |
catalog（3）
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