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UV Nanoimprint Stepper

Supports 2 to 8-inch wafers! Equipped with high-precision alignment necessary for device fabrication!

We would like to introduce our "UV Nanoimprint Stepper." It uses a roll transfer method with large resin molds, allowing for simultaneous full-area transfer. Additionally, we offer a heating mechanism as an optional extra, with high-precision transfer pressure control. 【Features】 ■ Compatible with 2 to 8-inch wafers ■ High-precision alignment necessary for device fabrication ■ High-precision transfer pressure control ■ Optional heating mechanism *For more details, please refer to the PDF document or feel free to contact us.

Related Link - https://www.sanmei.co.jp/1105-2/

basic information

【Specifications】 ■Model: ImpFlex-Essential Stepper ■Transfer Method: UV Nanoimprint ■Applicable Work: φ2 to 8 inches ■Mold: Quartz Mold, PDMS Mold ■Resist Coating: Pre-treatment by Spin Coater or Inkjet ■Alignment Accuracy: 1μm (depending on alignment mark size) ■External Dimensions: 1800 (H) × 760 (W) × 1160 (D) *For more details, please refer to the PDF document or feel free to contact us.

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For more details, please refer to the PDF document or feel free to contact us.

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Until now, we have continuously faced challenges with the desire to propose optimal system integration to our customers while sensitively responding to the trends of the times in industries such as paper, pulp, automotive, automotive parts, semiconductors, LCDs, and smartphones. Moving forward, we will actively enter the "three industries" of "food, pharmaceuticals, and cosmetics," which are essential for people's lives, while inheriting this way of thinking. Additionally, in fields expected to grow, such as semiconductors and high-performance LCDs, we will actively engage in the development and manufacturing of precision alignment exposure equipment, inspection equipment, and process manufacturing equipment as a device manufacturer.