Manual Double-Sided Mask Aligner 'BA100/160/200'

The illumination distribution of the exposure light source is within ±5%! A lineup of desktop and standalone models is available.

last updated Jul 25, 2025

Spray coater

3D resist coating compatible with MEMS devices! Miniaturization from water and low-viscosity liquids to high-viscosity liquids.

last updated Aug 03, 2023

Murabiyuwaa

It is possible to automatically detect and visualize even the smallest changes at the nanoscale without missing them!

last updated Jun 14, 2023

PEC process equipment

Achieving low prices with a simple structure! Introducing the GaN wafer low-damage etching device.

last updated Mar 03, 2023

UV Nanoimprint Stepper

Supports 2 to 8-inch wafers! Equipped with high-precision alignment necessary for device fabrication!

last updated Feb 08, 2023

Customized Inspection Device "SIM 3000"

Supports large workpieces such as 300mm×300mm size! Customizable base model.

last updated Feb 06, 2023

Wafer Edge Viewer "SIM-2300EG"

Equipped with recording function! Supports various wafers such as bonding, background grinding, and trimming.

last updated Feb 06, 2023

Mass production process exposure device "Fully Automatic Mask Aligner"

We offer sizes of 4 inches and 8 inches! It has high versatility compatible with round and square samples.

last updated Jul 25, 2025

Semi-automatic exposure device "Semi-automatic Mask Aligner"

Available in 4-inch and 8-inch sizes! A semi-automatic exposure device for mass production of various types that allows for alignment exposure!

last updated Jul 25, 2025