Batch Spray Acid/Solvent Autoload
100% focus on BATCHSPRAY technology! Significant reduction of water, exhaust, and chemicals [Wet chemical equipment for the semiconductor industry].
This 2-chamber system not only provides excellent etching uniformity but also reduces chemical usage. It is compatible with all types of wet etching processes. It includes high-precision mixing of chemicals in the tank, endpoint detection (EPD), and a patented retainer comb processing system. Furthermore, SicOzone resist stripping can be applied in the same chamber, which not only enhances flexibility but also reduces processing steps. 【Features】 ■ Throughput of up to 300 wph ■ Two process chambers ■ Uniformity with less than 1% variation ■ Installation area of less than 12 m² ■ Chemical recirculation through tank system ■ Process executable with sic/GaN *For more details, please refer to the PDF document or feel free to contact us.
basic information
【Products Offered】 ■BATCHSPRAY Clean Autoload ■BATCHSPRAY Acid Autoload ■BATCHSPRAY Solvent Autoload ■BATCHSPRAY Acid/Solvent Autoload ■BATCHSPRAY Acid/Clean Autoload ■BATCHSPRAY Acid ■BATCHSPRAY Solvent *For more details, please refer to the PDF document or feel free to contact us.
Price range
Delivery Time
Applications/Examples of results
For more details, please refer to the PDF document or feel free to contact us.
