All products and services
1～15 item / All 15 items
-
[Information] How far can ozone be used in semiconductor cleaning?
Amidst the growing attention on manufacturing processes with lower environmental impact, the spotlight is on the cleaning and resist stripping processes using ozone!
last updated
-
[Data] Semiconductor Batch Spray Cleaning
The batch spray system is an extremely efficient system that has low chemical consumption, requires minimal space, and enables various processes!
last updated
-
[Data] Removal of polymer residue after dry etching from the wafer.
By adopting sustainable products and processes, we can reduce the environmental impact and risks associated with the supply chain!
last updated
-
Process integration that realizes the rationalization of semiconductor wet processes.
If you have challenges with streamlining wet processes or saving space, this is a must-see. We are currently offering materials that introduce an overview of process integration technology.
last updated
-
Post-dry etching resin residue removal process "perc"
Remove resin residue after dry etching without using organic solvents!
last updated
-
Ozone Wafer Cleaning Process "SicOzone CLEAN"
Replace hydrogen peroxide with ozone! Significantly reduce water, exhaust, and chemicals [Wet process equipment for the semiconductor industry] Semi-automatic equipment.
last updated
-
Ozone-based resist stripping process "SicOzone Strip"
Ozone water for resist stripping! Significant reduction of water, exhaust, and chemicals [Wet process equipment for the semiconductor industry] Semi-automatic equipment.
last updated
-
Wet process equipment "BATCHSPRAY Acid"
100% focus on BATCHSPRAY technology! Significantly reduce water, exhaust, and chemicals [Wet process equipment for the semiconductor industry] Semi-automatic equipment.
last updated
-
Organic cleaning device "BATCHSPRAY Solvent"
100% focus on BATCHSPRAY technology! Significantly reduces water, exhaust, and chemicals [Wet process equipment for the semiconductor industry] Semi-automatic equipment.
last updated
-
BATCHSPRAY Acid/Clean Autoload
100% focus on BATCHSPRAY technology! Significantly reduce water, exhaust, and chemicals [Wet chemical equipment for the semiconductor industry].
last updated
-
Batch Spray Acid/Solvent Autoload
100% focus on BATCHSPRAY technology! Significant reduction of water, exhaust, and chemicals [Wet chemical equipment for the semiconductor industry].
last updated
-
Organic cleaning device 'BATCHSPRAY Autoload'
100% focus on BATCHSPRAY technology! Significantly reduces water, exhaust, and chemicals [Wet process equipment for the semiconductor industry] Fully automatic equipment.
last updated
-
Wet etching device "BATCHSPRAY Autoload"
100% focus on BATCHSPRAY technology! Significantly reduces water, exhaust, and chemicals [Wet chemical equipment for the semiconductor industry] Fully automated system.
last updated
-
High-precision wet device "BATCHSPRAY Autoload"
100% focus on BATCHSPRAY technology! Significantly reduces water, exhaust, and chemicals [Wet process equipment for the semiconductor industry] Fully automated equipment.
last updated
-
Siconnex Company Profile
100% focus on BATCHSPRAY technology! Significantly reduce water, exhaust, and chemicals.
last updated