[Information] How far can ozone be used in semiconductor cleaning?
Amidst the growing attention on manufacturing processes with lower environmental impact, the spotlight is on the cleaning and resist stripping processes using ozone!
This document contains information about the benefits of "SicOzone." Ozone is known as a very strong oxidizing agent and is effective in the oxidative decomposition of organic substances. It is stated that it can be discharged after use with minimal environmental impact. [Contents] ■ Introduction ■ Overview of Cleaning and Resist Stripping Processes using Ozone ■ Benefits of SicOzone ■ Conclusion *For more details, please download the PDF or feel free to contact us.
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Siconnex, headquartered in Europe, is a global manufacturer of wet process equipment for the semiconductor industry and related fields. We provide batch spray equipment for wet etching, cleaning, and resist stripping for a wide range of end products, including MEMS, power semiconductors, analog/mixed-signal semiconductors, and III-V semiconductors. Our equipment sets industry standards with safety, automation, compact footprint, high throughput, and efficient use of economic resources. There is a growing demand for our solutions as follows: - Environmentally friendly: cleaning and resist stripping with ozone - Optimal for small quantities and diverse processes with a small footprint - Automatic detection of etching end points with EPD - Efficient equipment that reduces chemical consumption