Aluminum oxide (Al2O3) target
For the manufacturing of insulating films in chip production, as well as the production of other high-performance electronic components, sensors, solar panels, and surface modification of optical devices such as displays!
■ Purity > 99.9% ■ Density (3.95 g/cm³) ■ Manufacturing method: Powder metallurgy *For more details, please download the PDF or feel free to contact us.
basic information
■ Actual product density ≧ 90% ■ No powder on the surface ■ Strong water absorption, vacuum packaging *For more details, please download the PDF or feel free to contact us.
Price range
Delivery Time
Applications/Examples of results
Main uses include insulating films in chip manufacturing, the production of other high-performance electronic components, surface modification of optical devices such as sensors, solar panels, and displays, forming transparent conductive films for use in architectural glass and solar cell modules.
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Distributors
Our company has established a close cooperative relationship with Suzhou Techno-Tech Optoelectronic Materials Co., Ltd., a Japanese-affiliated company with a local factory in China that boasts world-class technology in sputtering targets and bonding services, along with engineers who have many years of experience. We are pursuing further evolution together. Through this collaboration, we propose high-quality and cost-effective products and services. We accurately capture customer needs and provide suitable and top-level products and services. Additionally, we offer cutting-edge products and technologies in semiconductor equipment, materials, and metal products through our extensive network cultivated over many years. Our company aims to support the development of our customers' businesses and grow together, maximizing creativity and technical capabilities to provide new value to our customers.