Ion chromatography plays a vital role in trace analysis of semiconductor manufacturing processes.
To everyone involved in the semiconductor manufacturing process: We will introduce case studies of analysis using established methods that offer high separation performance for quickly identifying process contamination.
Ion contamination is a major concern for semiconductor manufacturing processes and finished devices, as it can lead to corrosion, erosion, and short circuits. Ion chromatography (IC) is an efficient analytical method that can quickly measure trace components and major constituents of various process contaminants in the semiconductor industry. We will introduce how our ion chromatography system can be utilized. *For more details, please download the PDF document or feel free to contact us.*
basic information
The Thermo Scientific Dionex Ion Chromatography System is equipped with innovative features such as automatic eluent generation (EG), high pressure (HPIC), capillary compatibility, and 4 μm columns, providing high-quality results quickly.
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Applications/Examples of results
- Measurement of trace anions in high-purity water using large-volume direct injection with a leachate generator - Measurement of trace anions in organic solvents using matrix removal and concentration - Measurement of trace transition metals in reagent-grade acids, bases, salts, and organic solvents - Measurement of chlorides in acidic copper plating baths - Monitoring of trace anion contamination in extracts of electronic components - Measurement of chlorine, bromine, and sulfur in polyethylene materials using combustion ion chromatography
