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The ultrasonic cleaning nozzle manufactured by Sonosys is featured in Semi Net.

ティックコーポレーション

ティックコーポレーション 本社

We solve the cleaning issues of semiconductors and substrates. SONOSYS offers a wide range of products in the field of ultrasonic and megasonic cleaning, with the goal of achieving excellent, damage-free cleaning results for fine micro and nano structures. By using SONOSYS systems, it is possible to save on power and chemical usage in wet bench processes, making them more efficient. ≪Product Overview≫ For non-contact single substrate cleaning, we have megasonic nozzles ranging from 600 kHz to a maximum of 9 MHz, equipped with either a single nozzle, dual nozzle, or triple channel, as well as any combination of frequencies. The transducer of this megasonic nozzle generates megasonic waves, which are sent through a fluid (such as pure water) to clean the surface of the substrate.

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Sonosys Ultrasonic Cleaning Device
For non-contact cleaning of single substrates, we offer megasonic nozzles ranging from 600kHz to a maximum of 9MHz, equipped with either a single nozzle, dual nozzle, or triple channel, along with any combination of frequencies. The transducer of this megasonic nozzle generates megasonics and sends them through a fluid (such as pure water) to clean the surface of the substrate.
*Video* [Sonosys] Ultrasonic Cleaning Device (Spray Nozzle Type) Demo
This is a demo of the spray nozzle type (megasonic) ultrasonic cleaning device. On the left side is a 1MHz single nozzle, and on the right side are 1MHz and 3MHz dual nozzles.

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