Ultrasonic Megasonic Cleaning Device (Single Sheet Cleaning / Bath Tank Type Cleaning)
Leave the latest ultrasonic cleaning to Sonosys.
Ultrasonic Cleaning Spray Nozzle For non-contact single substrate cleaning, we offer a megasonic nozzle with either a single nozzle, dual nozzle, or triple channel, and any combination of frequencies ranging from 600kHz to a maximum of 9MHz. The transducer of this megasonic nozzle generates megasonics and sends them through a fluid (such as pure water) to clean the surface of the substrate. Megasonic Immersion Transducer This is a megasonic immersion transducer with frequencies of 400kHz, 600kHz, 1MHz, and 2MHz. A sealed transducer made of stainless steel or plastic (e.g., PP, PVDF, or PFA) is installed at the bottom or side of an existing tank. In addition to standard systems for substrate sizes of 4", 6", and 8", custom immersion transducers are also available. The highly adaptable configuration allows the megasonic system to be used in bath-tank cleaning processes, improving cost-effectiveness. Frequencies available are 400kHz, 600kHz, 1MHz, and 2MHz.
basic information
Please refer to each product leaflet.
Price range
Delivery Time
Model number/Brand name
Sonosys
Applications/Examples of results
Cleaning of semiconductor wafers, photomasks, and MEMS.
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News about this product（6）
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The leaflet for the Sonosys Corporation's Mega Sonic System (FTF Transducer) has been completed.
The SONOSYS 1MHz megasonic system (FTF transducer & MGH generator) is a high-performance system that optimizes the cleaning process of single substrates. Applications and specific processes: Wafer cleaning Photomask cleaning Cleaning of MEMS devices Removal of fine particles from display panels and IC substrates Please refer to the leaflet for more details.
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An article about ultrasonic cleaning devices was published in the January issue of 【Sonosys】 Interface.
Following the December issue of Transistor Technology, an article about the ultrasonic cleaning device manufactured by Sonosys was published in the January issue of Interface.
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An article about the ultrasonic cleaning device was published in the December issue of 【Sonosys】 Transistor Technology.
Ultrasonic cleaning devices are essential for semiconductor cleaning equipment. The ultrasonic cleaning devices provided by Sonosys are unique products in the world and are adopted by many companies. For more details, please visit the URL below.
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We were once again recognized as the top semiconductor technology company in Germany for 2024 in the November issue of Semiconductor Review (this is a remarkable achievement since we received the award in 2022 as well).
In the November issue of Semiconductor Review, we were once again recognized as the top semiconductor technology company in Germany for 2024. Sonosys has outstanding ultrasonic cleaning technology, which is incorporated not only in Germany but also overseas and in cutting-edge ultrasonic cleaning devices in Japan. Comments from CEO Ralf Emberger are also available at the URL below. We kindly ask you to take a moment to read it.
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We will exhibit at SEMICON WEST.
Sonosys, a company known for its ultrasonic cleaning devices and ultrasonic cleaning spray nozzles, will be exhibiting at SEMICON WEST in San Francisco. They plan to showcase their latest ultrasonic cleaning devices and ultrasonic cleaning spray nozzles. Due to the recent semiconductor boom, ultrasonic cleaning devices are being used not only for wafer cleaning but also for cleaning MEMS and optical lenses, among other applications. It is reported that the president of Sonosys will also be present at the booth. Please take this opportunity to visit.
