【Features】 ≪Ultra-Precision High-Frequency Megasonic Cleaning Spray Nozzle≫ - Diverse cleaning needs addressed through combinations of single, dual, and triple channel nozzles and frequencies - Megasonic immersion-type transducer operating from 400kHz to 9MHz ≪Ultra-Precision High-Frequency Megasonic Immersion Cleaning System≫ - Stainless steel or plastic transducers - Compatible with 4", 6", and 8" substrate sizes - Improved cost-effectiveness through bath-tank cleaning 【Our Strengths】 Tick Corporation focuses on providing products that meet our customers' needs. With years of experience and a wide range of product offerings, we propose optimal cleaning solutions.

Sonosys

Single Wafer Cleaning Systems Applications • Non-contact cleaning of single substrates • High-precision particle removal • Megasonic cleaning using pure water as the medium • High-purity cleaning of semiconductor and optical components Examples • Introduced as custom cleaning equipment with single, dual, and triple nozzle configurations to semiconductor manufacturers Megasonic Cleaning Nozzles Applications • Single wafer cleaning • Photomask cleaning • Non-contact cleaning of MEMS and microstructures • Lift-off process • Improved chemical cleaning efficiency in semiconductor front-end processes • Energy-saving in wet bench processes (reduction of chemicals and electricity) Examples • Adopted worldwide as semiconductor front-end cleaning equipment using high-frequency megasonics from 400kHz to 9MHz • Used by MEMS manufacturers as a cleaning solution that minimizes damage to fine micro and nano structures