We have updated the page for the Remote Plasma Ion Beam Sputtering System manufactured by PlasmaQuest, which has received positive feedback from various companies since its introduction. We have also included a video on Remote Plasma Target Bias Sputtering. If you have any questions or requests, please feel free to contact us.

The MEMS Engineer Forum is a unique forum operated primarily by engineers among the key players in MEMS technology, which is considered a key technology of the 21st century. At this forum, where MEMS researchers, developers, and engineers from around the world gather, we will introduce and showcase the Remote Plasma Ion Beam Sputtering System manufactured by Plasma Quest Ltd. This is an excellent opportunity to see cutting-edge technologies related to MEMS, not only from our exhibition but from others as well. We sincerely invite you to attend.

We have updated the page for the Remote Plasma Ion Beam Sputtering System manufactured by PlasmaQuest, which has received positive feedback from various companies since its introduction. In particular, we have included information about the "control capabilities of reactive sputtering," which has garnered many inquiries from our customers. If you have any questions or requests, please feel free to contact us.

Research on Co-sputtering of different materials, such as ferromagnetic targets and metal and ceramic targets, which are considered difficult to film using conventional sputtering devices. We strongly support advanced material research and process development, including the deposition of AlScN, which is attracting attention for next-generation MEMS applications. This is a groundbreaking technology that uses a helicon ion source as a plasma source, accelerating high-density ions obtained from it by applying a bias voltage to the target. Since it is an ion beam-type deposition method using a remote plasma system, stable film formation can be achieved even with ferromagnetic and dielectric targets, which are challenging for magnetron sputtering devices. By individually controlling the ion source and target application, it is possible to accommodate a wide range of deposition conditions while also achieving high deposition rates. Independent gas supply near the target and substrate allows for the deposition of various multilayer thin films, including oxide and nitride films. Since the substrate surface is not exposed to plasma, it is possible to maintain a low temperature during film formation.

The MEMS Engineer Forum is a unique forum operated primarily by engineers among the key players in MEMS technology, which is considered a key technology of the 21st century. At this forum, where MEMS researchers, developers, and engineers from around the world gather, we will introduce and showcase the Remote Plasma Ion Beam Sputtering System manufactured by Plasma Quest Ltd. This is an excellent opportunity to see cutting-edge technologies related to MEMS, not only from our exhibition but also from others. We cordially invite you to attend. Venue: International Fashion Center Hall 1-6-1 Yokogawa, Sumida-ku, Tokyo 130-0015, Japan Access: https://www.tokyo-kfc.co.jp/access/ Exhibited Product: Remote Plasma Ion Beam Sputtering System by Plasma Quest Ltd. https://mono.ipros.com/product/detail/2001148974 https://www.plasmaquest.com/

MBraun is a specialized manufacturer of scientific instruments, starting with the production of high-quality glove boxes. We provide contract purification services and high-purity organic materials through our advanced in-house developed equipment. In addition to providing equipment for purifying organic materials, MBraun also offers contract purification services and high-purity organic materials through the equipment we have developed. We can flexibly accommodate everything from small-scale test purifications to mass production. Our advanced in-house developed devices achieve purification that balances high purity and high yield. With a yield that sets us apart from conventional methods, we minimize the loss of raw materials while achieving high purity, which enhances cost efficiency. We will enter into a non-disclosure agreement (NDA) when providing our services. You can use our purification services for advanced materials with confidence. 【Overview】 ■ Sublimation purification equipment for organic electronics materials - Accommodating from small quantities to mass production scale: 0.1g…>10kg ■ Contract purification service for organic materials: 0.1g…1kg ■ Supply of high-purity organic materials (e.g., fullerene C60)

As of April 2024, T.K.S. Co., Ltd. has become the exclusive distributor of PlasmaQuest products in Japan. We not only plan and produce ion beam sputtering systems for research and production but also support retrofitting using our unique plasma sources. Please feel free to consult us about upgrading, modernizing, or extending the life of existing equipment. PlasmaQuest Limited is a manufacturer with unique technology that enables high-quality and flexible film deposition using a helicon plasma source as an ion source, applying bias to the target and substrate. The gridless plasma source generates high-density ions and allows for maintenance-free operation over extended periods. Our high-quality and reliable plasma sources are also supplied as OEMs to equipment manufacturers as ion sources for production equipment, ensuring stable operation worldwide.

As of April 2024, T.K.S. Corporation has become the general agent in Japan. This device features a unique technology that enables high-quality and flexible film deposition using a helicon plasma source as the ion source, with bias application to the target and substrate. It performs independent current control for the ion source, target, and substrate. It can accommodate multiple targets, allowing for easy switching for multilayer film deposition. Additionally, it provides independent gas supply near the target and substrate, enabling the deposition of various multilayer optical thin films, including oxide and nitride films. This device is capable of supporting a wide range of research, including new material exploration and film deposition process development. It strongly supports advanced materials research and process development, including co-sputtering studies of ferromagnetic targets and the co-sputtering of metal and ceramic targets, which have been challenging with conventional sputtering devices. With its exceptional capabilities, it excels in the exploration of advanced materials and the development of deposition processes for applications such as solar power generation, optical thin films, battery materials, wearable displays, large-capacity storage devices, MEMS, magnetic heads, thin-film heads, thermal heads, spintronic materials, and Heusler alloys.

Starting in April 2024, we will establish a service center for inspection and repair of the "Magnetron Sputter Cathode" manufactured by Angstrome Science in the United States. The new service center will be equipped with clean room facilities, vacuum leak checkers, and various inspection instruments to ensure comprehensive maintenance. All work will be supervised and guided by qualified personnel who have completed training at Angstrome Science, providing services similar to those in the United States. Until now, we have primarily focused on repairs due to malfunctions, but with the opening of the service center, we will also be able to offer regular maintenance. We will conduct periodic inspections of the cathodes to support operations without downtime.

This is a device specialized in optical thin films, such as high-performance optical filters that require multilayering and high reproducibility, particularly for applications like LiDAR, which are expected to see significant demand in the future. It demonstrates strong capabilities for high-quality and stable production. - Film formation that eliminates the influence of film quality changes due to target consumption using a cylindrical cathode. - Stable film formation of oxide films achieved by incorporating a reactive ion source. - Film formation of a wide range of multilayer films enabled by the installation of up to four cathodes.