Sputtering device 'Star.500-EOSS(R)'
Developed for the purpose of achieving high uniformity and excellent reproducibility in the deposition of optical multilayer films!
We handle the 'Star.500-EOSS(R)' from the German company FHR. The 'Star.500-EOSS(R)' is a magnetron sputtering system designed for optical filter film deposition. To minimize particles during film deposition, a sputter-up method is employed. It accommodates flat and curved substrates up to 200mm in diameter, and a substrate heating mechanism can also be integrated. 【Features and Benefits】 ■ Outstanding reproducibility of optical multilayer films ■ Excellent film thickness uniformity ■ Improvement in film quality and defect-free deposition achieved through the combination of a cylindrical sputter cathode and sputter-up ■ Long target life and minimized variations in deposition rate due to cylindrical targets ■ Fully automated process control *For more details, please download the PDF or contact us.
basic information
【Main Applications】 ■ Anti-reflective coating ■ Bandpass filter ■ Edge filter ■ Notch filter ■ Dielectric mirror ■ Dichroic mirror ■ Beam splitter ■ Polarizing filter *For more details, please download the PDF or contact us.
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Applications/Examples of results
For more details, please download the PDF or contact us.
