Remote Ion Source Type HR-PVD Sputtering Module
A high ion current helicon plasma ion source PVD module that achieves directional film formation and enables reactive sputtering.
HR-PVD Sputtering Module by AVP Technology - Achieves higher ionization efficiency compared to ICP sources using a remote plasma source with a helicon plasma ion source. - Excellent straightness from the inclined angle direction results in outstanding film thickness uniformity and step coverage. - Enables film formation while keeping the substrate at a low temperature through remote plasma. - Also achieves excellent results in target utilization efficiency. *For more details, please contact us.
basic information
- Compatible with wafers up to 200mm. - It is also possible to install on used cluster tools by changing to AVP Technology's proprietary control system. Additionally, it can be used in conjunction with other PVD and etching modules. *For more details, please contact us.
Price range
Delivery Time
Model number/Brand name
HR-PVD Remote Plasma Sputtering Module
Applications/Examples of results
- Magnetic head - Thin film head - Thermal head - MEMS - Spintronics materials These are ideal for film formation applications of high magnetic materials and high dielectric materials.
