Sputtering device FHR.Star100-Tetra-Co
FHR Star.100-Tetra Co is a very compact sputtering device designed for MEMS and high-performance optical products.
This system is equipped with three sputtering sources and a pre-cleaning etcher, all arranged in a confocal shape, and it is also possible to add a load lock and a transport chamber to enhance productivity. The sputtering sources are equipped with a 100mm diameter shutter, which allows for film deposition control by managing this shutter. Additionally, the distance between the source and the substrate can also be controlled. These controls are optimized for film deposition through auto-control via programming. Main applications: Manufacturing of MEMS products and high-performance optical products Dimensions (L×W×H): 2.3 m × 1.3 m × 2.1 m Weight (with load lock): 1,700 - 2,000 kg Maximum substrate size: Diameter 150 mm Maximum substrate carrier: Diameter 220 mm Compatible process gases: Argon, oxygen, and others For more details, please contact us.
basic information
For more details, please contact us.
Price range
Delivery Time
Model number/Brand name
FHR Star100-Tetra-Co
Applications/Examples of results
【Main Applications】 ■ Anti-reflective coating ■ Bandpass filter ■ Edge filter ■ Notch filter ■ Dielectric mirror ■ Dichroic mirror ■ Beam splitter ■ Polarizing filter ■ Wearable display
