High-speed film-forming ALD device 'FHR.STAR-400x300SALD'
Compatible with in-situ ellipsometers and transmission spectrometers! High-speed ALD equipment manufactured by the German company FHR.
The "FHR.STAR-400x300SALD" is a high-speed deposition ALD (Spatial ALD) system designed for film deposition on substrates and textiles ranging from 200mm wafers to 400x300mm. It enables uniform film deposition on three-dimensional shapes up to 10mm thick for 400x300 substrates. Due to its faster deposition compared to conventional thermal ALD methods, it can be used for mass production of devices and is designed to accommodate in-situ ellipsometers and transmission spectrometers, allowing for more precise process control. With a cluster-compatible design, it can integrate transport chambers, load locks, and other process chambers as needed. We also offer equipment compatible with small-diameter wafers, so please inquire for more information. 【Features】 ■ Uniform film deposition on three-dimensional shapes up to 10mm thick (for 400x300 substrates) ■ Faster deposition compared to conventional thermal ALD methods ■ Usable for mass production of devices *You can download the English version of the catalog. *For more details, please refer to the PDF materials or feel free to contact us.
basic information
【Other Features】 ■ Supports film deposition on substrates and textiles up to 200mm wafers and 400x300mm ■ Designed to accommodate in-situ ellipsometers and transmission spectrometers ■ Enables more precise process control ■ Cluster-compatible design allows for integration of transport chambers, load locks, and other process chambers as needed ■ Equipment for small diameter wafers is also available * You can download the English version of the catalog. * For more details, please refer to the PDF materials or feel free to contact us.
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*You can download the English version of the catalog. *For more details, please refer to the PDF document or feel free to contact us.
