UV Exposure Device LUV-1000
High-strength exposure device guaranteed for parallelism.
This is an exposure device that uses a 2kW ultra-high pressure mercury lamp. It can be controlled from dedicated PC software, and it is also capable of adjusting the mask flatness and the gap with the glass. This is the exposure printing equipment with the guaranteed parallelism. 2kW extra-high pressure mercury lamp is equipped. It can be controlled with the designated PC software and the shutter controller. It can adjust a gap to the glass and flatten the photomask. It can expose lights with sophisticated patterns. We can customize the size of photomask or other features.
basic information
Model:LUV-1000 Light source:Extra-pressure mercury lamp 2kW Wavelength [nm]:300 - 500 Managed wavelength: 365 Intensity [mW/㎠]:30 - 40 Total luminous flux [lm]:90,000 Illuminance plane (WxH) [mm]:150x150 Illuminance unevenness [± %]:5 in active range Setting range:Collimation half angle: 2.0 [deg] Declination angle: 0.5 [deg] Display / Operation:Designated PC software Shutter controller Supported OS:Windows 10, 11 Communication I / F: Connector: USB2.0 Type-B Communication: UART by Virtual COM port Power-supply voltage:Single-phase 200V, 50/60Hz Power consumption [VA]:Less than 40A Dimension (WxHxD) [mm]:1150 x 2010 x 1400 Weight [kg]:300
Price range
Delivery Time
Model number/Brand name
LUV-1000
Applications/Examples of results
Photolithography
