High-frequency cleaning unit: Application example - Semiconductor manufacturing process
Maintains stable performance even in low output areas! Suitable for cleaning delicate parts.
We propose a "high-frequency cleaning unit" for semiconductor manufacturing processes. Many customers using sputtering equipment or CVD equipment may be requesting the regeneration of fixtures from manufacturers. In specific cases, ultrasonic cleaning can cause damage to parts. Our ultrasonic technology maintains stable performance even at low output levels, making it suitable for cleaning delicate components. We assist in improving cleaning quality by utilizing various frequencies of ultrasound to recover more precious metals, such as gold, while simultaneously enhancing the cleanliness of fixtures and completely removing metal ions. [Features] - Achieves uniform power distribution within large cleaning tanks, which are often required. - Optimizes cleaning power with a wide range of output adjustments. *For more details, please refer to the PDF materials or feel free to contact us.
basic information
For more details, please refer to the PDF document or feel free to contact us.
Price range
Delivery Time
Applications/Examples of results
For more details, please refer to the PDF document or feel free to contact us.
