All products and services
31～60 item / All 61 items
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Drug delivery device
Equipped with a built-in control panel! Direct supply from chemical manufacturers' concentrated liquid tanks or CCSS is possible.
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Organic solvent cleaning equipment
The system consists of the main unit, pump unit, and control panel! The chemical supply method is the CCSS method for organic solvent cleaning equipment.
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Mist Disinfection Device 'kolleii GDK-500'
Automatic spraying with a human sensor! Introducing a micro mist shower with an alert function!
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[Campaign] Mist Disinfection Device kolleii GDK-500
Limited to the first 10 units, free rental for the first month! A mist shower unit designed for antiviral, antibacterial, and deodorizing purposes.
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Various manufacturing equipment
A wide range of products including semiconductor manufacturing equipment, cleaning devices for LED and OLED, and air purification devices.
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Non-contact transport cleaning device 'DNCC-320'
It is also possible to transport thin lightweight substrates under 0.5t! A next-generation cleaning device that can clean fingerprints from skin oils, glass cullet, and oil-based markers.
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High-pressure pulse jet cleaning machine "DPC-700"
Cleaning effectiveness achievable because we are a semiconductor cleaning equipment manufacturer! Challenging new fields with proven submicron particle removal performance.
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BOX cleaning device 'DBC-1700'
Continuous processing of warm water washing, rinsing, and draining in the same tank! Containers of all shapes and sizes can be cleaned.
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Aerial Transport Cleaning Device 'DACC-061-3L'
Next-generation cleaning device that allows for roller-driven end face and size adjustment in the river width direction.
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Chemical liquid scrub spin cleaning device
Complete various cleaning processes to spin drying in a single chamber. Space-saving design suitable for research and development as well as small lot production.
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1-chamber type liquid chemical spin scrub cleaning machine
We will provide an environment for scrub cleaning and chemical spin cleaning tests of wafers from φ2” to φ12” in response to research and development and small lot production with space-saving solutions by next spring.
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Wafer edge mirror polishing device (Edge Polish)
Polishing equipment (Edge Polish) that performs mirror polishing, rough polishing, and cleaning using filtered water and pure water as the medium without slurry.
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Precision parts cleaning device (degreasing)
Degreasing cleaning device for HDD motor parts (HUB, case, etc.) Example configuration: detergent + ultrasonic (degreasing cleaning) → pure water rinse + ultrasonic → warm air drying → vacuum drying
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Si Nugget Cleaning Device
Si Nugget cleaning device with automatic transport using a dedicated basket, from chemical polishing, acid cutting, high-quality water washing to drying, improving cleaning efficiency through basket oscillation.
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300mm Cassette-less Cleaning System
Used in the chemical polishing process after final polishing / Batch processing of 50 pieces / Achieving high purity of 19nμm/5 pieces
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FOUP cleaning device
Cleaning difficult-to-wash uneven surfaces with high-pressure pulse jets! More stable cleaning results can be achieved compared to manual cleaning.
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FOSB cleaning device
Cleaning difficult-to-clean uneven surfaces with high-pressure pulse jets! More stable cleaning results can be achieved compared to manual cleaning.
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Box cleaning device
Cleaning difficult-to-wash uneven surfaces with high-pressure pulse jets! More stable cleaning results can be achieved compared to manual cleaning.
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Cassette box cleaning device
Cleaning difficult-to-clean uneven surfaces with high-pressure pulse jets! More stable cleaning results can be achieved compared to manual cleaning.
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High-pressure intermittent spray "DP-Gun"
For cleaning various masks, glass, and after wafer polishing! Capable of opening and closing the nozzle 30 times per second, it delivers repeated impacts with a small amount of water.
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High-pressure pulse jet DP-Gun for cleaning masks, glass, and wafers.
If the pressure is the same, the water usage is 1/3; if the flow rate is the same, the pressure is 3 times; with a lower flow rate, there are repeated impacts. For removing slurry after mask and glass cleaning wafer polishing.
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Dry Dispersion Device "Particle-Compatible Dispersion and Spreading Device"
This is a dry spraying device that disperses and uniformly scatters particles ranging from several micrometers to several hundred nanometers through frictional charging. It achieves stable spraying with charge amount feedback control!
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Dry Spreading Device "Desktop Type Simple Spreader"
This is a dry spraying device that disperses and uniformly scatters particles ranging from several micrometers to several hundred nanometers through frictional charging. It achieves stable spraying with charge amount feedback control!
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Dry Spreader Device "Dry Spacer Spreading Device"
This is a dispersion device that disperses and uniformly scatters particles ranging from several hundred nanometers to several tens of micrometers through frictional charging. It achieves stable dispersion with charge amount feedback control.
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Single Chamber Type "Wafer Multi-Purpose Spin Scrub Cleaning Device"
A space-saving cleaning device that removes foreign substances and metal contamination in a single chamber! It accommodates applications from mass production to research and development through a combination of cleaning methods.
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LT・SiC and other 2 to 6-inch small diameter wafer simultaneous chemical scrub cleaning device
A chemical cleaning device that enables the removal of contaminants, metal pollution, and transport and drying without touching the front and back surfaces of the workpiece! It also supports a combination with brush cleaning using chemicals.
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Dual-side simultaneous scrub cleaning device for small diameter wafers (LT, SiC, etc. 2 to 6 inches)
A scrub cleaning device that allows for transportation and drying without touching the front and back of the workpiece! In addition to simultaneous cleaning of the front, back, and sides with a unique mechanism, it also supports combinations with ultrasonic showers and more.
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Wafer cleaning device "Double-sided brush cleaning device (for research and development)"
It is possible to transport, wash, and dry without touching the front and back surfaces of the work.
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Wafer cleaning device "Double-sided scrub cleaning device (for research and development)"
It is possible to transport, wash, and dry without touching the front and back surfaces of the workpiece.
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Wafer cleaning device "Double-sided brush cleaning device (mass production type)"
It is possible to transport, wash, and dry without touching the front and back surfaces of the work.
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