All products and services
1～30 item / All 61 items
-
Wafer cleaning device "Double-sided brush cleaning device (mass production type)"
It is possible to transport, wash, and dry without touching the front and back surfaces of the work.
last updated
-
Wafer cleaning device "Double-sided scrub cleaning device (for research and development)"
It is possible to transport, wash, and dry without touching the front and back surfaces of the work.
last updated
-
Wafer cleaning device "Double-sided brush cleaning device (for research and development)"
It is possible to transport, wash, and dry without touching the front and back surfaces of the work.
last updated
-
Space-saving type "Spin Cleaning Device (Multipurpose Cleaning Type)"
One-chamber multi-purpose scrub cleaning. It is possible to remove foreign substances and metal contamination in one chamber! Space-saving, making it suitable for research and development.
last updated
-
Dual-side simultaneous scrub cleaning device for small diameter wafers (LT, SiC, etc. 2 to 6 inches)
A scrub cleaning device that allows for transportation and drying without touching the front and back of the workpiece! In addition to simultaneous cleaning of the front, back, and sides with a unique mechanism, it also supports combinations with ultrasonic showers and more.
last updated
-
High-pressure intermittent spray "DP-Gun"
For cleaning various masks, glass, and after wafer polishing! It can open and close the nozzle 30 times per second, delivering repeated impacts with a small amount of water.
last updated
-
FOUP cleaning device
Cleaning difficult-to-clean uneven surfaces with high-pressure pulse jets! More stable cleaning results can be achieved compared to manual cleaning.
last updated
-
FOSB cleaning device
Cleaning difficult-to-clean uneven surfaces with high-pressure pulse jets! More stable cleaning results can be achieved compared to manual cleaning.
last updated
-
Box cleaning device
Cleaning difficult-to-clean uneven surfaces with high-pressure pulse jets! More stable cleaning results can be achieved compared to manual cleaning.
last updated
-
Cassette box cleaning device
Cleaning difficult-to-clean uneven surfaces with high-pressure pulse jets! More stable cleaning results can be achieved compared to manual cleaning.
last updated
-
Dry spreading device "Desktop type simple spreading device"
This is a dry spraying device that disperses and uniformly scatters particles ranging from several micrometers to several hundred nanometers through frictional charging. It achieves stable spraying with charge amount feedback control!
last updated
-
Dry dispersion device "Particle-compatible dispersion and spreading device"
This is a dry spraying device that disperses and uniformly scatters particles ranging from several micrometers to several hundred nanometers through frictional charging. It achieves stable spraying with charge amount feedback control!
last updated
-
High-pressure pulse jet DP-Gun for cleaning masks, glass, and wafers.
With the same pressure, the water usage is 1/3; with the same flow rate, the pressure is three times higher; and with a lower flow rate, there are repeated impacts. For removing slurry after mask and glass cleaning wafer polishing.
last updated
-
Dry Spreader Device "Dry Spacer Spreading Device"
This is a dispersion device that disperses and uniformly scatters particles ranging from several hundred nanometers to several tens of micrometers through frictional charging. It achieves stable dispersion through charge amount feedback control.
last updated
-
LT・SiC and other 2 to 6-inch small diameter wafer simultaneous chemical scrub cleaning device.
A chemical cleaning device that enables transportation and drying without touching the front and back of the workpiece, as well as the removal of foreign substances and metal contamination! It also supports a combination with brush cleaning using the chemical solution.
last updated
-
300mm wafer cassette-less cleaning system
Achieved 65nμm / 5 pieces of high purity! Inserted 25 pieces into the gaps of 25 Wf, halving the pitch and processing 50 pieces at once.
last updated
-
GaAs etching equipment
Automatically mixes the chemical solution and delivers the required amount to the etching tank! It uses a sequencer control method.
last updated
-
IR Drying Oven
The processing speed is 75mm/s! The glass substrate is heated and dried with a clean far-infrared heater.
last updated
-
Processing equipment for OLEDs
Processing speed is 0.6 to 5.0 m/min (variable)! We provide cleaning equipment for organic EL manufacturing lines.
last updated
-
Cassette cleaning device for PDP
Designed and manufactured to match the cassette! An automatic cleaning device that performs pure water high-pressure washing and warm air drying.
last updated
-
Si Nugget Cleaning Device
Using hydrofluoric acid and nitric acid! The cleaning basket is agitated to improve cleaning efficiency!
last updated
-
Incubator (Constant Temperature Chamber) 'DAN-3502'
Gentle handling with a non-slip scooper! Supports shelf information management and barcode management as well.
last updated
-
Wafer transfer device
The Orifura alignment can be switched using a switch! A wafer transfer device that flips the even rows of wafers in the central part.
last updated
-
Fried drying furnace
Manufactured to match the glass size! Drying of the frit paste applied to the glass panel will be carried out.
last updated
-
Mask glass cleaning device
The passline is 400mm! It will be cleaned with SPM and neutral detergent + US, and dried with warm water extraction.
last updated
-
Yutaka Drying Device
No watermark generation! A device that dries using the principle of surface tension with slow lifting.
last updated
-
Magnetic head cleaning device
The rinse drying process is a composite rinse drying treatment that incorporates pure water dip, QDR, pure water shower, and spin dryer into one chamber!
last updated
-
Automated transport cassette clean oven
Introducing the automatic cassette clean oven with a conveyor that can process one set at a time!
last updated
-
Vacuum drying device
The work placement table inside the drying oven is specially designed! The front door opens to one side, providing a wide opening that makes it easy to load and unload parts.
last updated
-
Precision parts cleaning device
Introduction to a precision parts cleaning device that can be customized for various applications using a dedicated basket for dip processing!
last updated