JIB-4700F Composite Beam Processing Observation Device
Achieved a guaranteed resolution of 1.6 nm at a low acceleration voltage of 1 kV.
The Japan Electronics Corporation JIB-4700F composite beam processing observation device meets the high resolution and precision needs for evaluation techniques such as morphological observation, elemental analysis, and crystallographic analysis. Combined with the "in-lens Schottky electron gun," it enables high-resolution observation and high-speed analysis. 〇 Features - High-resolution SEM observation - High-speed analysis - High-speed processing - Enhanced detection system - Three-dimensional observation and analysis *For more details, please download the PDF or feel free to contact us.
basic information
【Specifications】 〇SEM Acceleration Voltage: 0.1 to 30.0 kV Resolution (at optimal WD): 1.2 nm (15 kV, GB mode) 1.6 nm (1 kV, GB mode) Magnification: x20 to 1,000,000 (LDF mode equipped) 〇FIB Acceleration Voltage: 1 to 30 kV Image Resolution: 4.0 nm (30 kV) Magnification: x50 to 1,000,000 (x50 to 90 is possible at acceleration voltage below 15 kV) *For more details, please refer to the PDF or feel free to contact us.
Price information
Please contact us.
Price range
P9
Delivery Time
OTHER
There may be fluctuations depending on the delivery area, so please feel free to contact us.
Model number/Brand name
JIB-4700F
Applications/Examples of results
【Purpose】 Three-dimensional observation of fine areas of metallic materials, three-dimensional observation of elements and crystals, etc.
