BS-60610BDS Bombard Evaporation Source
High-rate processing, thick film deposition, large equipment compatibility
The BS-60610BDS Bombard deposition source from Nippon Electronics Corporation is a vacuum deposition source that utilizes the electron beam bombardment indirect heating method. By adding a beam scan function to the conventional model (BS-60310BDS), features such as high rate capability, thick film deposition, and compatibility with large equipment are achieved. 〇Features - Increased liner capacity. - High rate capability. - Compatibility with large equipment. - Thick film capability. Also suitable for infrared applications. - Rate stabilization. - Low damage, low defects, low absorption. *For more details, please download the PDF or feel free to contact us.
basic information
【Specifications】 BS-60610BDS: Bombard deposition source, main unit, 6-point liner type Output: Maximum 4.8 kW Cooling water: 4-5 L/min, water temperature 10-25°C Operating pressure: 5×10^-5 to 1×10^-2 Pa
Price information
Please contact us regarding the price.
Price range
P5
Delivery Time
OTHER
Delivery areas may vary, so please feel free to contact us.
Model number/Brand name
BS-60610BDS
Applications/Examples of results
【Usage】 Vacuum deposition
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Since its establishment in 1974, Azusa Science Co., Ltd. has contributed to the local community as a specialized trading company with strengths in both the scientific and medical fields, supporting the advancement of life-pursuing science. We offer a wide range of products in various fields, including physical and chemical instruments, medical devices, testing equipment, analytical instruments, in vitro diagnostic reagents, pharmaceuticals, reagents, and consumables, responding to the increasingly sophisticated and diverse needs of our customers. Furthermore, we are actively advancing software development utilizing our network, working on systematization for our customers and revitalizing communication with them.