BS-60610BDS Bombard Evaporation Source
High-rate processing, thick film deposition, large equipment compatibility
The BS-60610BDS Bombard deposition source from Nippon Electronics Corporation is a vacuum deposition source that utilizes the electron beam bombardment indirect heating method. By adding a beam scan function to the conventional model (BS-60310BDS), features such as high rate capability, thick film deposition, and compatibility with large equipment are achieved. 〇Features - Increased liner capacity. - High rate capability. - Compatibility with large equipment. - Thick film capability. Also suitable for infrared applications. - Rate stabilization. - Low damage, low defects, low absorption. *For more details, please download the PDF or feel free to contact us.
basic information
【Specifications】 BS-60610BDS: Bombard deposition source, main unit, 6-point liner type Output: Maximum 4.8 kW Cooling water: 4-5 L/min, water temperature 10-25°C Operating pressure: 5×10^-5 to 1×10^-2 Pa
Price information
Please contact us regarding the price.
Price range
P5
Delivery Time
OTHER
Delivery areas may vary, so please feel free to contact us.
Model number/Brand name
BS-60610BDS
Applications/Examples of results
【Usage】 Vacuum deposition
