BS-80020CPPS Plasma Source
Even without heating, good adhesion can be achieved, and a high-density thin film can be formed.
The BS-80020CPPS plasma source from Nippon Electronics Corporation is a plasma source designed for low-temperature processes that suppresses the temperature rise of substrates and materials while enhancing the ion irradiation energy to the substrates/materials. It is suitable for film formation applications on plastics and organic films (plasma-assisted deposition) as well as for surface modification applications. 〇 Features - Good adhesion even without heated film formation - High-density thin films are formed - Can be retrofitted to existing vacuum chambers *For more details, please download the PDF or feel free to contact us.
basic information
【Specifications】 Maximum discharge output: 3.2kW (160V, 20A) Discharge gas (Ar): 8 to 20 mL/min *For more details, please download the PDF or feel free to contact us.
Price information
Please contact us.
Price range
P7
Delivery Time
OTHER
Delivery areas may vary, so please feel free to contact us.
Model number/Brand name
BS-80020CPPS
Applications/Examples of results
[Purpose] Film formation on plastics and organic films (plasma-assisted deposition) and surface modification.
