BS-80011BPG Built-in Plasma Gun for High-Density Plasma Generation
It is possible to improve the film properties of thin films, protective films, and functional films.
The BS-80011BPG built-in plasma gun from Nippon Electronics Corporation is a plasma source designed to generate high-density plasma when installed in a vacuum chamber. By combining it with vacuum deposition, the plasma-assisted deposition (ion plating) method can enhance the film properties of optical thin films, protective films, and functional films. It is also effective for substrate cleaning and surface modification. 〇 Features - High-density direct current plasma with low voltage and high current efficiently ionizes gas molecules and evaporated particles. - Reactive deposition is possible. - High-rate film formation is achievable over large areas. - Can be mounted on vacuum systems with various layouts. *For more details, please download the PDF or feel free to contact us.
basic information
【Specifications】 Maximum discharge output: 6kW (160V, 38A) Operating pressure: 1×10-2 to 1×10-1 Pa (in Ar, O2, N2 atmosphere) *For details, please refer to the PDF or feel free to contact us.
Price information
Please contact us.
Price range
P7
Delivery Time
OTHER
Delivery areas may vary, so please feel free to contact us.
Model number/Brand name
BS-80011BPG
Applications/Examples of results
【Applications】 Plasma-assisted deposition, cleaning, surface modification
