Non-oxidizing constant temperature device HISPEC N type
Achieve improved workability with a high N2 gas replacement rate, reduced N2 gas usage, and shortened temperature drop time.
Heat treatment of electronic components with copper and silver electrodes is conducted in a nitrogen gas atmosphere to prevent oxidation. The HISPEC N type constant temperature chamber developed by Kusumoto Chemical Co., Ltd. in the Etak division is a dedicated chamber designed for such specialized heat treatment. ○ Features - Guarantees residual oxygen concentration below 100 ppm - Improved productivity through enhancements in the temperature drop mechanism - Uniformity of temperature improves the yield of heat treatment *For more details, please refer to the PDF or feel free to contact us.
basic information
【Specifications】 Model: HT320N Circulation Method: Forced hot air circulation Temperature Range: (Room temperature + 40℃) to 250℃ Temperature Distribution: ± 3.5℃ (at 250℃) Temperature Rise Time: Within 60 minutes (from room temperature to 250℃) Residual Oxygen Concentration: Below 100ppm *For more details, please refer to the PDF or feel free to contact us.
Price information
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Delivery Time
Applications/Examples of results
[Purpose] Dedicated equipment that requires special heat treatment.
