Process Gas Monitor "M-080QA-HPM"
Achieves a wide range (1 to 80 amu) and high-sensitivity partial pressure measurement from the reached pressure of the vacuum chamber to the sputtering process pressure.
The process gas monitor "M-080QA-HPM" is a quadrupole mass spectrometer capable of measuring in the mass range of 1 to 80 amu, and it can measure from pressures below 2.0 Pa (no differential pumping system required). It monitors the partial pressure of gases during the process, detects abnormalities such as process gas anomalies and leaks, and provides process stability. It can be utilized for quality control and residual gas analysis during the process. 【Features】 ■ High sensitivity detection of hydrogen during the process ■ High sensitivity measurement across a wide pressure range ■ Long maintenance cycle and low running costs ■ Various alarm functions to detect abnormalities during production *For more details, please refer to the PDF document or feel free to contact us. The document states the operating pressure as "below 1.3 Pa," but the correct value is "below 2.0 Pa."
basic information
【Specifications (Excerpt)】 ■Measurement mass range: m/z 1 to 80 ■Operating pressure: 2.0 Pa or less ■Minimum detection concentration: 5 ppm (excluding H2) H2: 100 ppm ■SEM sensitivity: 7.5 × 10^-5 A/Pa or more ■Faraday sensitivity: 7.5 × 10^-9 A/Pa or more ■Connection flange: φ 70 ICF ■Weight: Analysis tube 1.1 kg, Controller 2.2 kg ■Communication standard: RS-232C or RS-485 ■Control software: QUADVISION3 compatible with Win7, 8.1, 10 *For more details, please refer to the PDF document or feel free to contact us.
Price range
Delivery Time
Applications/Examples of results
【Usage】 ■Quality control during film formation ■Residual gas analysis ■Leak check *For more details, please refer to the PDF document or feel free to contact us.
