Manual anodizing device
A porous silicon formation device that further applies conventional anodizing equipment. Porous silicon wafers are formed depending on the chemical solutions used and the current density.
The anodizing device was traditionally a device that flowed current to form an oxide film, but the further developed porous silicon formation device is one that forms porous silicon by changing the chemical solution and current density used. *For more details, please download the PDF (catalog) or feel free to contact us.*
basic information
【Features】 ■ Customization is possible according to the application, making it suitable for research and development. ■ Options for liquid supply and recovery functions, concentration meters, etc., can be selected. ■ Anodizing jigs will be proposed according to various sizes.
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Applications/Examples of results
Semiconductor manufacturing processes, electronic materials manufacturing processes, etc.
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