半導体関連装置
半導体関連装置
パソコンや電化製品の核となる半導体にも、ダルトンの技術が活きています。前工程の洗浄装置を中心に、安全性と機能性を兼ね備え、充実したラインナップで提供しています。
1～23 件を表示 ／ 全 23 件
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Vacuum heating furnace with a bomb
It is a device that removes impurities attached to high-purity gas cylinders used in semiconductor manufacturing processes.
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HFE vapor drying device
Products that fully consider safety.
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Porous silicon formation device (anodization device)
A porous silicon formation device that further applies conventional anodic oxidation equipment. Porous silicon wafers are formed depending on the chemical solution used and the current density.
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Fixture cleaning device
We can design and manufacture cleaning solutions for all types of fixtures, including cassettes and quartz fixtures, according to your needs. Stainless steel options are also available.
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Resist stripping and cleaning device *Testable models available
A wet process cleaning device with a variety of circulation methods.
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Wafer cleaning device (batch type) *Testable models available
We propose specifications that consider cost reduction through wet etching.
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Lift-off device *Models available for testing
We customize the equipment by selecting each process and specification from the lineup of single-sided and batch types.
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Career stocker
Store the carrier as is or in a case.
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Wafer cleaning device (spin type) *Testable models available
Supports multiple chambers according to production scale. Achieves uniform etching of wafers.
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Conveyor-type etching device
Customization specifications tailored to your requests. We can accommodate everything from experimental machines to production machines.
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Fume hood for semiconductor manufacturing (integrated equipment type)
Customization according to the specifications for work and usage is possible.
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Quartz tube cleaning device
We can design and manufacture cleaning solutions for all types of jigs, including cassettes and quartz jigs, upon consultation. Stainless steel options are also available.
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Manual anodizing device
A porous silicon formation device that further applies conventional anodizing equipment. Porous silicon wafers are formed depending on the chemical solutions used and the current density.
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Spin dryer
Supports processing from 1 carrier to 4 carriers.
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Reticle Carrier Stocker
Store the reticle in the stepper case.
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Quartz tube storage facility
Safe storage of quartz tubes and fixtures.
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Chemical storage cabinet
Chemical storage cabinet with exhaust function suitable for clean rooms.
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Exhaust gas treatment system (scrubber) for semiconductor manufacturing equipment
By installing an indoor scrubber that corresponds to exhaust gas and airflow, a safe operating environment can be achieved even in places without exhaust gas treatment facilities.
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Solvent regeneration device (continuous type)
A distillation regeneration system that vaporizes waste solvents and then liquefies them again for recovery.
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Batch-type solvent regeneration system
A distillation regeneration system that vaporizes waste solvents and recovers them by re-liquefying.
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Spin coater integrated fume hood
This is a fume hood equipped with a spin coater manufactured by Mikasa.
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FOUP cleaning device
It is a device that uses a special high-pressure nozzle, allowing for cleaning and drying without the use of chemicals.
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Dual-sided brush spin cleaning device (post-CMP cleaning) *Test machine available
It is a device that cleans the surface and back of the wafer with a brush at the same time.
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