Colloidal silica polishing material for silicon wafers 'GLANZOX'
Meeting the demands for higher flatness, damage-free, and free from heavy metal contamination with a complete mirror finish!
"GLANZOX" has made it possible to achieve excellent polished surfaces by dispersing colloidal silica in a specially formulated liquid. In recent years, there have been strict reduction requirements for metallic impurities that affect device characteristics. In response, we have developed ultra-high purity colloidal silica. We offer dedicated polishing materials such as the "GLANZOX E Series" for finishing wafer edges to a mirror-like surface. 【Features】 ■ Disperses colloidal silica in a specially formulated liquid ■ Enables the realization of excellent polished surfaces ■ Developed ultra-high purity colloidal silica ■ Provides high-dimensional polishing materials *For more details, please refer to the PDF document or feel free to contact us.
basic information
【Other Features】 <GLANZOX E Series> ■ A dedicated polishing material that finishes the wafer edge to a mirror surface ■ Based on colloidal silica ■ Prepared in a special composition solution ■ Excellent cleaning properties after polishing with high efficiency *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
