Abrasive material
Abrasive material
Here is an introduction to our polishing materials.
1～17 item / All 17 items
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Alumina abrasive material 'A' suitable for precision grinding stones and polishing cloths for ultra-finish.
Maintains stable polishing performance! Suitable for materials such as precision grinding stones for ultra-finish and ultra-finish polishing cloths.
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High-purity alumina-based polishing material 'WA' suitable for various applications.
For precision wrapping, blasting processing, materials for ultra-finish precision grinding wheels, and materials for polishing tapes! Abrasives capable of advanced surface processing.
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Alumina polishing material for metals 'FM'
It is possible to achieve a clear polish even on fine structures such as high-speed steel and alloys! The use of materials like cloth and felt is also acceptable. Processing is easy.
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High-purity alumina polishing material 'FAL'
Contact lenses, alumina polishing material suitable for polishing soft metals.
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99.9% pure α-alumina polishing material 'FS'
Ultra-fine particles with a purity of 99.9% and above! For the final finishing of contact lenses and precision machine parts.
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Alumina-based precision wrapping material "FO"
Exhibits excellent processing performance for optical materials such as semiconductor wafers and lenses! Precision lapping materials made from carefully selected materials.
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Polishing material for plastic lenses "POLIPLA"
A wide variety is available! You can achieve a high polishing rate and a good finish surface.
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CLEALITE Series for Metal and Metal Oxide Polishing Slurry
A polishing material that efficiently removes machining marks and molding marks, achieving a uniform smooth surface.
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General metal mirror finish silica polishing material "CLEALITE"
For general metals such as copper, aluminum, stainless steel, and titanium!
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Black carbonized silicon grinding material 'C'
Alpha-type silicon carbide abrasive material used for precision lapping of grinding cloth, ultra-fine precision grinding stones, cast iron, brass, etc.
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Wire saw, high-purity α-type silicon carbide abrasive material for wrapping processing 'GC'
Resistant to chemicals, it self-generates sharp grinding edges through crushing, demonstrating excellent polishing power!
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"FZ" zirconia polishing material for special alloys and optical lenses.
A deep, scratch-free glossy surface unique to metal!
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Polishing material for semiconductor devices "PLANERLITE"
A polishing material suitable for those seeking "high purity, high processing efficiency, high dispersion, and scratch-free."
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Colloidal silica polishing material for silicon wafers 'GLANZOX'
Meeting the demands for higher flatness, damage-free, and free from heavy metal contamination with a complete mirror finish!
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High Purity Colloidal Silica Slurry Polishing Material 'COMPOL'
Achieve a damage-free polished surface with high efficiency! Mirror finishing is possible on various materials such as electronic material substrates like sapphire, metals, and ceramics.
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Polishing and etching materials for compound semiconductors, 'INSEC'
Finishing compound semiconductor crystals to a mirror-like precision through mechanochemical processing!
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Diamond slurry polishing material "DIATEC"
Diamond slurry polishing material suitable for lapping ferrite, superhard metals, ceramics, and more.
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