We are pleased to announce that Hayashi Junyaku Kogyo Co., Ltd. has developed UHP grade PGMEA, guaranteed to contain metal impurities of 33 elements at less than 50 ppt. We have installed small-scale production equipment at our Mie factory and have begun sample work. This grade is proposed for use in fields requiring ultra-low metal content, such as semiconductor materials and ultra-trace element analysis. <Features> - Low metal content through purification Guaranteed to contain 33 elements at less than 50 ppt - Metal assurance through high-precision analysis Introduction of ICP-MS/MS and improvement of analytical techniques - Thorough quality control Clean management from manufacturing environment to supply containers - Compatible with various containers 500ml, 20L, 200L poly containers 18L canisters, etc. - Second phase in development PGME, ethyl lactate, and others □ For other functions and details, please refer to the documentation.

Lin Jun Pharmaceutical Industry Co., Ltd. has developed a crystal etching solution for crystal devices. Etching solutions commonly used for wet etching of crystals include hydrofluoric acid (HF) and a mixed solution of HF and ammonium fluoride (NH4F), but they have various issues. Therefore, our company has developed a crystal etching solution that reduces the angle difference in taper angles of cross-sectional shapes due to etching, enabling the flattening of the etched surface and uniform etching thickness through our unique technology. □ For other functions and details, please refer to the materials.

Lin Jun Pharmaceutical Industry Co., Ltd. has developed a high-performance etching solution that can etch silver nanowires, which are a transparent conductive film alternative to ITO. Silver nanowire transparent conductive films are gaining attention in the touch panel field as a substitute for ITO, and their development is being actively pursued. However, due to the characteristic that the wiring patterns are more easily visible compared to ITO, technology is needed to make the wiring patterns less visible during product commercialization. Therefore, our company has developed an etching solution that can make the wiring patterns less visible through our unique technology. □ For other functions and details, please refer to the materials.

Lin Jun Pharmaceutical Industry Co., Ltd. has recently started handling a high-performance etching solution that can etch and roughen the surface of GaN films (N-face) in the blue light-emitting diode process. By roughening the surface, the light extraction efficiency is improved, resulting in a higher luminous efficiency. Our company will continue to propose environmentally conscious functional chemicals to many companies to support the improvement of luminous efficiency in blue LEDs. □ For other functions and details, please refer to the materials.

Lin Jun Pharmaceutical Industry Co., Ltd. has recently developed a damage-free aluminum (Al) etching solution for silicon oxide and silicon nitride (insulation film) etching. By using this etching solution, it becomes possible to etch insulation films without corroding Al or Al alloys, eliminating the need for processes to protect Al or Al alloys, which can improve the overall throughput of the manufacturing process. Our company will continue to propose functional chemical solutions that emphasize energy savings and cost reduction through process shortening to many companies.

Lin Jun Pharmaceutical Industry Co., Ltd. has recently developed an etching solution for texture (roughness) formation processing for monocrystalline silicon solar cells. By using this etching solution, it has become possible to effectively and easily form textured structures on monocrystalline silicon surfaces without the use of special techniques. Our company will continue to propose environmentally conscious functional chemicals to many companies, supporting the improvement of conversion efficiency in solar cells, which are expected to expand rapidly. □ For other functions and details, please refer to the materials.

Lin Jun Pharmaceutical Industry Co., Ltd. has recently developed an etching solution that allows for the easy formation of desired surface roughness on AlGaAs and GaAs semiconductor films and substrates, as well as GaP semiconductor films and substrates in the LED process, without the use of special techniques. Our company will propose functional chemical solutions that focus on improving LED luminous efficiency and supporting energy-saving in various devices to many companies. □ For other functions and details, please refer to the materials.

We have successfully developed a high-performance etching solution that can etch and roughen the surface of AlGaInP films (semiconductor films) in the LED (light-emitting diode) process. By applying this etching solution, it has become possible to efficiently etch and roughen the surface of the semiconductor film that constitutes the light extraction surface of the LED without using any special techniques. In the future, this is expected to contribute to the enhancement of brightness, processing precision, and reliability of LED products, which are anticipated to experience high growth, and we plan to propose and sell it not only for LED manufacturing but also for various other fields. □ For other functions and details, please refer to the materials.