【Product Information】Metal Seal Mass Flow Controller/ Meter 'GF100 Series'

ITWジャパン
Model GF100 / GF101 / GF120 / GF120XSL / GF120XSD / GF121 / GF125 / GF126 "Achieving high purity and ultra-high purity process gas supply with excellent response speed and repeatability" The GF100 series, designed for semiconductor, MOCVD, and other gas flow control applications, ensures high repeatability and stable performance, providing reliability that exceeds industry standards. With standard MultiFlo(TM) technology, it supports thousands of combinations of gas types and ranges without disconnecting from the gas line or sacrificing accuracy. It achieves industry-leading gas cleanliness while enhancing process flexibility and efficiency, maximizing yield and productivity. Applications ■ Semiconductor etching tools ■ Thin film chemical vapor deposition (CVD) systems (CVD, MOCVD, PECVD, ALD) ■ Physical vapor deposition (PVD) systems ■ Epitaxial process systems
