Continuous Atmospheric Pressure CVD System for solar cell mass production (AMAX1000S)
For mass production of crystalline Si solar cells/For NSG(SiO2)/PSG/BSG deposition High productivity/Continuous atmospheric pressure CVD (APCVD) system
AMAX1000S is a continuous atmospheric pressure CVD system (APCVD system) developed for solar cell products based on the achievements of the "AMAX" series. 【Features】 ・Compatible with 156 mm square/125 mm square wafers ・High productivity of 1500 wafers per hour ・Compatible with thin wafers for solar cells 【Applications】 ・Hard mask for diffusion/ion implantation, Sacrificial deposition (NSG) ・Passivation deposition (protective deposition, insulating deposition) (NSG) ・Source deposition for solid phase diffusion (BSG, PSG)/Cap deposition (NSG) *For more details, please contact us or download the catalog to view.
basic information
A large dispersion head (gas nozzle) and ultra high-speed double-arm transfer mechanism are installed to enable mass production that meets solar cell production needs. In addition, a special wafer holder, lamp heating mechanism, multi-stage Bernoulli chuck, etc. are used to accommodate thin wafers for solar cells. ●System size (mm): 1860(W) x 5900(D) x 2100(H) ●Gas type: SiH4/O2 (SiH4/PH3/B2H6/O2/N2) ●Deposition temperature: up to 430 degrees C *For more details, please contact us or download the catalog to view.
Price range
Delivery Time
Model number/Brand name
AMAX1000S
Applications/Examples of results
【Applications】 ・Hard mask for diffusion/ion implantation, Sacrificial deposition (NSG) ・Passivation deposition (protective deposition, insulating deposition) (NSG) ・Source deposition for solid phase diffusion (BSG, PSG)/Cap deposition (NSG) 【Delivery Record】 ・Domestic and overseas solar cell manufacturers
