Spin Type Cleaning System WULF series for high definition photomasks
Equipped with a spin cleaning unit that uses tap water. This method utilizes a cleaning solution that replaces the RCA cleaning solution.
Our group company's cleaning system contributes to high purity and yields improvement in photomask/reticle products. We will cooperate with manufacturers to improve their production capability. 【Features】 ・Contributes to high purity and yields process improvement ・Removes organic matter, metal ions, and foreign matter, which may no longer be detectable ・Environmentally friendly tool removes impure deposits on work surface quickly and is environmentally safe for liquid waste management ・Utilizes a cleaning solution and cleaning method that replaces the RCA cleaning solution. ・Equipped with a spin cleaning unit that uses regular water. ・High-speed diffusion of washing liquid to the cleaning surface ・Dries without watermark deposits 【Applications】 ・Product cleaning for photomask/reticle/mask blank manufacturers ・Reticle cleaning before exposure to semiconductor device manufacturers ・Product cleaning in a semiconductor device manufacturer's in-house mask line (mask shop) 【Delivery record】 ・Domestic and overseas mask blanks, photomasks, and reticle manufacturers ・Domestic and overseas device manufacturers *For more details, please contact us or download and view the catalog.
basic information
As LSI becomes more sophisticated, photomasks/reticles are required to be more precise and accurate. Our cleaning systems contribute to these products' high purity and yield improvement. We will cooperate with manufacturers to produce more complete products. This unit is capable of removing organic matter, metal ions, and foreign matter to become undetectable by using a spin cleaning unit that utilizes regular water, the centrifugal force of work rotation, and the discharge of ozone water and ammonia-added hydrogen water. This environmentally friendly tool removes impure deposits on work surfaces quickly and is safe for liquid waste management, by switching each cleaning solution. Utilizes cleaning solution and cleaning method that replaces the RCA cleaning solution SPM → Ozone water ・Standard room temperature cleaning (No highーtemperature process required) ・Reduction of the residual amount of chemical solution on masks ・Secure disposal of liquid waste (Corresponds to ISO14000) SC-1 → Ammonia-added hydrogen water ・Etching prevention of MoSi halftone mask *For more details, please contact us or download our catalog for further information.
Price range
Delivery Time
Model number/Brand name
WULF series
Applications/Examples of results
【Applications】 ・Product cleaning for photomask/reticle/mask blank manufacturers ・Reticle cleaning before exposure to semiconductor device manufacturers ・Product cleaning in a semiconductor device manufacturer's in-house mask line (mask shop) 【Delivery Record】 ・Domestic and overseas mask blank, photomask, and reticle manufacturers ・Domestic and overseas device manufacturers
