ファインシリーズ洗浄ユニット
ファインシリーズ洗浄ユニット
サブミクロンのパーティクルを 750kHz～3.0MHzの高周波でダメージレス洗浄。
1～13 item / All 13 items
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Cleaning Unit "Fine Jet"
Stable oscillation from low to high output to meet a wide range of needs for single-sheet cleaning!
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Cleaning Unit "Fine Scroll"
Introduction of sheet and flat feeding cleaning tools for small substrates to large LCD panels!
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Cleaning Unit "Fine Sonic"
Batch-type megasonic! Various frequencies such as 750kHz and 2000kHz can be selected.
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Fine Series Cleaning Unit
Damage-free cleaning of submicron particles with high frequency from 750 kHz to 3.0 MHz.
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Cleaning unit "Proximity Type Megasonic PA10-Q60AE-S"
Suitable for cleaning silicon wafers, photomasks, liquid crystal glass, magnetic disks, etc., cleaning after CMP, and batch-type cleaning.
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Ultrasonic cleaning unit
Remove particles through cavitation generated by ultrasonic liquid resonance! Suitable for cleaning magnetic disks and more.
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Cleaning unit for semiconductor wafers 'PA10-Q60AE-S'
Efficient removal of fine particles through direct substrate irradiation. Precision wafer cleaning unit using high-frequency megasonic. *Demo unit available.
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Proximity Megasonic for Photomasks PA10-Q60AE-S
A cleaning unit that achieves submicron level particle removal.
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Cleaning unit for semiconductors "Fine Jet"
From low power to high power, we meet the precision cleaning needs of semiconductor manufacturing!
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Cleaning Unit "Fine Jet" for Electronic Devices
From low power to high power, we meet a wide range of needs for electronic device circuit board cleaning!
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Cleaning unit "Fine Jet" for glass surface treatment.
From low power to high power, we meet a wide range of needs for glass surface treatment!
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Cleaning Unit "Fine Jet" for the Chemical Field
A cleaning unit that promotes chemical reactions from low power to high power.
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Cleaning Unit "Fine Jet" for Metal Processing
From low power to high power, we meet the needs for deburring and cleaning in metal processing!
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