Cleaning Unit "Fine Jet"

Stable oscillation from low to high output to meet a wide range of needs for single-sheet cleaning!

last updated Oct 08, 2025

Cleaning Unit "Fine Scroll"

Introduction of sheet and flat feeding cleaning tools for small substrates to large LCD panels!

last updated Oct 08, 2025

Cleaning Unit "Fine Sonic"

Batch-type megasonic! Various frequencies such as 750kHz and 2000kHz can be selected.

last updated Oct 08, 2025

Fine Series Cleaning Unit

Damage-free cleaning of submicron particles with high frequency from 750 kHz to 3.0 MHz.

last updated Oct 22, 2025

Cleaning unit "Proximity Type Megasonic PA10-Q60AE-S"

Suitable for cleaning silicon wafers, photomasks, liquid crystal glass, magnetic disks, etc., cleaning after CMP, and batch-type cleaning.

last updated Nov 05, 2025

Ultrasonic cleaning unit

Remove particles through cavitation generated by ultrasonic liquid resonance! Suitable for cleaning magnetic disks and more.

last updated Oct 22, 2025

Cleaning unit for semiconductor wafers 'PA10-Q60AE-S'

Efficient removal of fine particles through direct substrate irradiation. Precision wafer cleaning unit using high-frequency megasonic. *Demo unit available.

last updated Dec 11, 2025