1-4 Resin pillar scanning electron microscope (SEM) images
When a mask is overlaid and exposed on the substrate, resin pillars are formed, and when plated, holes with inverted shapes are created.
- The design of the photomask used during exposure allows for the creation of any hole shape. - When designing the photomask, whether the pattern area that light passes through is negative or positive can result in holes of the same shape or fine components. - It is impossible to process high-precision fine holes with a thickness of several tens of micrometers at a "narrow pitch" using other methods.
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Semtech Engineering Co., Ltd. specializes in ultra-fine processing using electroforming technology, as well as the development and contract manufacturing of ultra-high precision sieves and ultra-high precision fine molds. We excel in ultra-high aspect ratio technology that is impossible with etching, so please feel free to contact us with your inquiries.