薄膜形成装置
薄膜形成装置
スパッタリング装置、真空蒸着装置、プラズマCVD装置についてご紹介します。
1~6 件を表示 / 全 6 件
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Research and development vacuum deposition device
Flexible response according to purpose and cost! For universities, public research institutions, and basic experiments.
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Vacuum Deposition Device for Automotive Parts (AAMF-C1075SR Type)
Compact housing supports full coating of large resin molded products such as automotive exterior parts, achieving dry processing of resin surface treatment through high-speed batch processing.
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Large resin substrate deposition device
High adhesion to the resin substrate due to discharge cleaning with high-frequency plasma before film formation.
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Simple experimental sputtering device
Two models: manual batch type and simple load lock type. The simple load lock type enables the mass production process of compound semiconductors. Currently accommodating sample tests and equipment tours.
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Research and development sputtering equipment
Compact, low-cost, and feature-rich, low-cost sputtering equipment for research and development. Sample testing and facility tours available.
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ALN coating device (high-density plasma sputtering ADMS device)
Forming crystalline AlN films with high-density plasma sputtering, compatible with full coating on three-dimensional shapes. Fully automated mass production equipment lineup.
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