すべての製品・サービス
1～11 件を表示 ／ 全 11 件
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Post-dry etching resin residue removal process "perc"
Remove resin residue after dry etching without using organic solvents!
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Ozone Wafer Cleaning Process "SicOzone CLEAN"
Replace hydrogen peroxide with ozone! Significantly reduce water, exhaust, and chemicals [Wet process equipment for the semiconductor industry] Semi-automatic equipment.
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Ozone-based resist stripping process "SicOzone Strip"
Ozone water for resist stripping! Significant reduction of water, exhaust, and chemicals [Wet process equipment for the semiconductor industry] Semi-automatic equipment.
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Wet process equipment "BATCHSPRAY Acid"
100% focus on BATCHSPRAY technology! Significantly reduce water, exhaust, and chemicals [Wet process equipment for the semiconductor industry] Semi-automatic equipment.
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Organic cleaning device "BATCHSPRAY Solvent"
100% focus on BATCHSPRAY technology! Significantly reduces water, exhaust, and chemicals [Wet process equipment for the semiconductor industry] Semi-automatic equipment.
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BATCHSPRAY Acid/Clean Autoload
100% focus on BATCHSPRAY technology! Significantly reduce water, exhaust, and chemicals [Wet chemical equipment for the semiconductor industry].
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Batch Spray Acid/Solvent Autoload
100% focus on BATCHSPRAY technology! Significant reduction of water, exhaust, and chemicals [Wet chemical equipment for the semiconductor industry].
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Organic cleaning device 'BATCHSPRAY Autoload'
100% focus on BATCHSPRAY technology! Significantly reduces water, exhaust, and chemicals [Wet process equipment for the semiconductor industry] Fully automatic equipment.
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Wet etching device "BATCHSPRAY Autoload"
100% focus on BATCHSPRAY technology! Significantly reduces water, exhaust, and chemicals [Wet chemical equipment for the semiconductor industry] Fully automated system.
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High-precision wet device "BATCHSPRAY Autoload"
100% focus on BATCHSPRAY technology! Significantly reduces water, exhaust, and chemicals [Wet process equipment for the semiconductor industry] Fully automated equipment.
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Siconnex Company Profile
100% focus on BATCHSPRAY technology! Significantly reduce water, exhaust, and chemicals.
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